Ultrathin WOx interfacial layer improving the ferroelectricity and endurance of Hf0.5Zr0.5O2 thin films on polyimide

Ultrathin WOx interfacial layer improving the ferroelectricity and endurance of Hf0.5Zr0.5O2 thin films on polyimide

Here we report substantial effects of inserting PVD-prepared highly-conductive ultrathin WOx as interfacial layer in TiN/Hf0.5Zr0.5O2(HZO)/TiN structure on the ferroelectricity of HZO thin films. The prepared TiN/WOx/HZO/WOx/TiN capacitor, exhibiting a remnant polarization (Pr) of 18.8 μC/cm2 at 2 M...

Full description

Saved in:
Bibliographic Details
Main Authors: Chunxu Zhao, Huiping Wang, Xinyu Gu, Wei Zhang, Yubao Li
Format: Article
Language:English
Published: Elsevier 2025-07-01
Series:Journal of Materiomics
Subjects:
WOx interfacial layer
Hf0.5Zr0.5O2 ferroelectrics
Endurance
Polyimide
Flexible electronics
Online Access:http://www.sciencedirect.com/science/article/pii/S2352847824001813
Tags: Add Tag
No Tags, Be the first to tag this record!

Similar Items

Similar Items