Combined etching technology for controlling surface damage precursors to improve laser damage resistance of fused silica

Combined etching technology for controlling surface damage precursors to improve laser damage resistance of fused silica

At present, a single post-processing technology will always introduce secondary defects (trace pollution elements and structural defects) while removing surface processing defects of fused silica components, which limits the further improvement of the laser damage threshold of the components. Theref...

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Bibliographic Details
Main Authors: Zhigang Yuan, Wenhui Deng, Qiancai Wei, Bo Li, Lian Zhou, Qinghua Zhang, Jian Wang, Xiaotao Zu, Xiangyang Lei, Bo Zhong
Format: Article
Language:English
Published: Elsevier 2024-11-01
Series:Results in Physics
Subjects:
Fused silica
Combined etching technology
Damage precursor
Laser damage resistance
Online Access:http://www.sciencedirect.com/science/article/pii/S221137972400696X
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