Combined etching technology for controlling surface damage precursors to improve laser damage resistance of fused silica
At present, a single post-processing technology will always introduce secondary defects (trace pollution elements and structural defects) while removing surface processing defects of fused silica components, which limits the further improvement of the laser damage threshold of the components. Theref...
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| Main Authors: | , , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2024-11-01
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| Series: | Results in Physics |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S221137972400696X |
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