METHODS FOR OBTAINING SUB-PIXEL RESOLUTION DURING AUTOMATIC INSPECTION OF PATTERN MASTER MASKS OF INTEGRATED CIRCUITS
The paper reveals significance and complexity of automatic inspection of pattern master masks of integrated circuits under conditions of continuous decrease of topological design specifications. Two methods for obtaining sub-pixel resolution are presented in the paper. The first method is based on...
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| Main Author: | |
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| Format: | Article |
| Language: | Russian |
| Published: |
Belarusian National Technical University
2008-03-01
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| Series: | Наука и техника |
| Online Access: | https://sat.bntu.by/jour/article/view/726 |
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