Supercritical metalens at h-line for high-resolution direct laser writing

Supercritical metalens at h-line for high-resolution direct laser writing

Supercritical lens (SCL) can break the diffraction limit in the far field and has been demonstrated for high-resolution scanning confocal imaging. Its capability in sharper focusing and needle-like long focal depth should allow high-resolution lithography at violet or ultraviolet (UV) wavelength, ho...

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Bibliographic Details
Main Authors: Jichao Fu, Mengting Jiang, Zeng Wang, Yi Fan Chen, Yuanda Liu, Qing Yang Steve Wu, Ai Jia Sim, Jiang Wang, Mingxi Chen, Ziyu Wang, Jie Deng, Xiao Song Eric Tang, Kun Huang, Hong Liu, Jinghua Teng
Format: Article
Language:English
Published: Editorial Office of Opto-Electronic Journals, Institute of Optics and Electronics, CAS, China 2024-10-01
Series:Opto-Electronic Science
Subjects:
metalens
direct laser writing
supercritical lens
diffraction limit
ultraviolet metasurface
Online Access:https://www.oejournal.org/article/doi/10.29026/oes.2024.230035
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https://www.oejournal.org/article/doi/10.29026/oes.2024.230035

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