Enhanced UV Resistance of Poly(methyl methacrylate) Through Schiff Base and Metal Oxide Nanoparticle Incorporation
In this work, a novel poly(methyl methacrylate) (PMMA) material was prepared by incorporating Schiff base and metal oxide nanoparticles (NPs). Hence, different polymer derivatives were produced, and their resistance to light degradation was improved. PMMA was subjected to chemical modification, firs...
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| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Department of Chemistry, Universitas Gadjah Mada
2025-03-01
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| Series: | Indonesian Journal of Chemistry |
| Subjects: | |
| Online Access: | https://jurnal.ugm.ac.id/ijc/article/view/97173 |
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