Experimental study of inductively coupled plasma etching of patterned single crystal diamonds

Experimental study of inductively coupled plasma etching of patterned single crystal diamonds

Abstract In this study, the inductively coupled plasma (ICP) etching process for patterning single-crystal diamond was experimentally investigated using O₂/Ar as the etching gas. The influence of various etching parameters on the process was analyzed via laser confocal microscopy. Taking etching rat...

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Bibliographic Details
Main Authors: Lei Zhao, Xiangbing Wang, Nan Jiang, Kazhihito Nishimura, Jian Yi, Shuangquan Fang
Format: Article
Language:English
Published: Nature Portfolio 2025-07-01
Series:Scientific Reports
Subjects:
Inductively coupled plasma etching
Etching parameters
Single crystal diamond
Etching rate
Surface roughness
Online Access:https://doi.org/10.1038/s41598-025-08066-3
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