Formation of Cu-Al layered materials by detonation spraying and modification of the interface by annealing/spark plasma sintering

Cu-Al layered structures are frequently encountered in electrical and electronic devices and facilities as both metals possess a high electrical conductivity. In the present work, a new approach was used to fabricate Cu-Al bi-layers. The layers were formed by successively depositing copper and alumi...

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Bibliographic Details
Main Authors: Dudina Dina V., Ulianitsky Vladimir Yu., Tokarev Vadim G.
Format: Article
Language:English
Published: International Institute for the Science of Sintering, Beograd 2024-01-01
Series:Science of Sintering
Subjects:
Online Access:https://doiserbia.nb.rs/img/doi/0350-820X/2024/0350-820X2300062D.pdf
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