Combined etching technology for controlling surface damage precursors to improve laser damage resistance of fused silica
At present, a single post-processing technology will always introduce secondary defects (trace pollution elements and structural defects) while removing surface processing defects of fused silica components, which limits the further improvement of the laser damage threshold of the components. Theref...
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| Format: | Article |
| Language: | English |
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Elsevier
2024-11-01
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| Series: | Results in Physics |
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| Online Access: | http://www.sciencedirect.com/science/article/pii/S221137972400696X |
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| author | Zhigang Yuan Wenhui Deng Qiancai Wei Bo Li Lian Zhou Qinghua Zhang Jian Wang Xiaotao Zu Xiangyang Lei Bo Zhong |
| author_facet | Zhigang Yuan Wenhui Deng Qiancai Wei Bo Li Lian Zhou Qinghua Zhang Jian Wang Xiaotao Zu Xiangyang Lei Bo Zhong |
| author_sort | Zhigang Yuan |
| collection | DOAJ |
| description | At present, a single post-processing technology will always introduce secondary defects (trace pollution elements and structural defects) while removing surface processing defects of fused silica components, which limits the further improvement of the laser damage threshold of the components. Therefore, to effectively remove surface defects in optically-processed fused silica and suppress defect regeneration is the key to improve the laser damage resistance performance of the components. Based on the complementarity of anisotropic ion beam etching and isotropic HF acid etching, a combined etching technology is proposed for fused silica components used in engineering. The combined etching can remove most of the fragmented defects on fused silica surface to achieve relatively good surface quality with a root mean square roughness of 0.666 nm. After the combined etching, the contents of most impurity elements decrease by approximately an order of magnitude. Besides, the contents of the structural defects significantly reduce. Therefore, The zero probability damage threshold and the 100 % probability damage threshold increase by 32.41 % and 57.46 %, respectively. The results show that the combined etching technology can effectively improve the laser damage resistance performance of fused silica components, especially under high fluence laser irradiation, which is very important for the high power output and stable operation of laser facilities. |
| format | Article |
| id | doaj-art-cdd65d35d21c4ec38875d06a31669c60 |
| institution | Kabale University |
| issn | 2211-3797 |
| language | English |
| publishDate | 2024-11-01 |
| publisher | Elsevier |
| record_format | Article |
| series | Results in Physics |
| spelling | doaj-art-cdd65d35d21c4ec38875d06a31669c602024-11-18T04:33:03ZengElsevierResults in Physics2211-37972024-11-0166108011Combined etching technology for controlling surface damage precursors to improve laser damage resistance of fused silicaZhigang Yuan0Wenhui Deng1Qiancai Wei2Bo Li3Lian Zhou4Qinghua Zhang5Jian Wang6Xiaotao Zu7Xiangyang Lei8Bo Zhong9Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China; Corresponding authors.Research Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, ChinaResearch Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, ChinaYangtze Delta Region Institute (Huzhou), University of Electronic Science and Technology of China, Huzhou 313001, ChinaResearch Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, ChinaResearch Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, ChinaResearch Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, ChinaYangtze Delta Region Institute (Huzhou), University of Electronic Science and Technology of China, Huzhou 313001, ChinaResearch Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, ChinaResearch Center of Laser Fusion, China Academy of Engineering Physics, Mianyang 621900, China; Corresponding authors.At present, a single post-processing technology will always introduce secondary defects (trace pollution elements and structural defects) while removing surface processing defects of fused silica components, which limits the further improvement of the laser damage threshold of the components. Therefore, to effectively remove surface defects in optically-processed fused silica and suppress defect regeneration is the key to improve the laser damage resistance performance of the components. Based on the complementarity of anisotropic ion beam etching and isotropic HF acid etching, a combined etching technology is proposed for fused silica components used in engineering. The combined etching can remove most of the fragmented defects on fused silica surface to achieve relatively good surface quality with a root mean square roughness of 0.666 nm. After the combined etching, the contents of most impurity elements decrease by approximately an order of magnitude. Besides, the contents of the structural defects significantly reduce. Therefore, The zero probability damage threshold and the 100 % probability damage threshold increase by 32.41 % and 57.46 %, respectively. The results show that the combined etching technology can effectively improve the laser damage resistance performance of fused silica components, especially under high fluence laser irradiation, which is very important for the high power output and stable operation of laser facilities.http://www.sciencedirect.com/science/article/pii/S221137972400696XFused silicaCombined etching technologyDamage precursorLaser damage resistance |
| spellingShingle | Zhigang Yuan Wenhui Deng Qiancai Wei Bo Li Lian Zhou Qinghua Zhang Jian Wang Xiaotao Zu Xiangyang Lei Bo Zhong Combined etching technology for controlling surface damage precursors to improve laser damage resistance of fused silica Results in Physics Fused silica Combined etching technology Damage precursor Laser damage resistance |
| title | Combined etching technology for controlling surface damage precursors to improve laser damage resistance of fused silica |
| title_full | Combined etching technology for controlling surface damage precursors to improve laser damage resistance of fused silica |
| title_fullStr | Combined etching technology for controlling surface damage precursors to improve laser damage resistance of fused silica |
| title_full_unstemmed | Combined etching technology for controlling surface damage precursors to improve laser damage resistance of fused silica |
| title_short | Combined etching technology for controlling surface damage precursors to improve laser damage resistance of fused silica |
| title_sort | combined etching technology for controlling surface damage precursors to improve laser damage resistance of fused silica |
| topic | Fused silica Combined etching technology Damage precursor Laser damage resistance |
| url | http://www.sciencedirect.com/science/article/pii/S221137972400696X |
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