Direct optical second harmonic generation probing of manufactured effect at interfaces between high-κ dielectric and silicon

Direct optical second harmonic generation probing of manufactured effect at interfaces between high-κ dielectric and silicon

The selection of fabrication method is essential in dielectric layer fabrication of the field-effect transistors. In this study, the second harmonic generation (SHG) signals are observed from the interfaces between high-κ dielectric layers fabricated by different methods and silicon substrate, a pro...

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Bibliographic Details
Main Authors: Yue Fu, Ruichen Niu, Hongda Zhao, Guangtong Jiang, Kunpeng Zhang, Zhe Zhang, Siwei Zhang, Junbin Li, Ran Wang, Zichen Zhang
Format: Article
Language:English
Published: AIP Publishing LLC 2025-04-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/5.0255449
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http://dx.doi.org/10.1063/5.0255449

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