Extreme Ultraviolet Multilayer Defect Profile Parameters Reconstruction via Transfer Learning with Fine-Tuned VGG-16

Extreme Ultraviolet Multilayer Defect Profile Parameters Reconstruction via Transfer Learning with Fine-Tuned VGG-16

Extracting defect profile parameters from measured defect images poses a significant challenge in extreme ultraviolet (EUV) multilayer defect metrologies, because these parameters are crucial for assessing defect printing behavior and determining appropriate repair strategies. This paper proposes to...

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Bibliographic Details
Main Authors: Hala Mohammad, Jiawei Li, Bochao Li, Jamilu Tijjani Baraya, Sana Kone, Zhenlong Zhao, Xiaowei Song, Jingquan Lin
Format: Article
Language:English
Published: MDPI AG 2025-04-01
Series:Micromachines
Subjects:
EUV lithography
multilayer defects
transfer learning
fine-tuning
VGG-16
Online Access:https://www.mdpi.com/2072-666X/16/5/541
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