An Improved Algorithm to Extract Moiré Fringe Phase for Wafer-Mask Alignment in Nanoimprint Lithography
This paper proposes an improved algorithm based on the phase extraction of the Moiré fringe for wafer-mask alignment in nanoimprint lithography. The algorithm combines the strengths of the two-dimensional fast Fourier transform (2D-FFT) and two-dimensional window Fourier filtering (2D-WFF) to quickl...
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| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2024-11-01
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| Series: | Micromachines |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2072-666X/15/12/1408 |
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