An Improved Algorithm to Extract Moiré Fringe Phase for Wafer-Mask Alignment in Nanoimprint Lithography

This paper proposes an improved algorithm based on the phase extraction of the Moiré fringe for wafer-mask alignment in nanoimprint lithography. The algorithm combines the strengths of the two-dimensional fast Fourier transform (2D-FFT) and two-dimensional window Fourier filtering (2D-WFF) to quickl...

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Bibliographic Details
Main Authors: Feifan Xu, Yinye Ding, Wenhao Chen, Haojie Xia
Format: Article
Language:English
Published: MDPI AG 2024-11-01
Series:Micromachines
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Online Access:https://www.mdpi.com/2072-666X/15/12/1408
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