Skip to content
About the Library
Rules and Regulations
Library Services
Library Hours
About Us
Library News
Digital Repository
Google Scholar
ResearchGate
AJoGPL
KURJ
AJLS
Research
MyLOFT
Lexis Plus UK
Britannica Academic
Research Support Tools
Quick Resource Links
E-Resources
Login
All Fields
Title
Author
Subject
Call Number
ISBN/ISSN
Tag
Find
Advanced
An Improved Algorithm to Extra...
Text this
Text this:
An Improved Algorithm to Extract Moiré Fringe Phase for Wafer-Mask Alignment in Nanoimprint Lithography
Number:
Provider:
Select your carrier
Alltel
AT&T
Cricket
Nextel
Sprint
T Mobile
Verizon
Virgin Mobile
