APA (7th ed.) Citation

Xu, F., Ding, Y., Chen, W., & Xia, H. An Improved Algorithm to Extract Moiré Fringe Phase for Wafer-Mask Alignment in Nanoimprint Lithography. MDPI AG.

Chicago Style (17th ed.) Citation

Xu, Feifan, Yinye Ding, Wenhao Chen, and Haojie Xia. An Improved Algorithm to Extract Moiré Fringe Phase for Wafer-Mask Alignment in Nanoimprint Lithography. MDPI AG.

MLA (9th ed.) Citation

Xu, Feifan, et al. An Improved Algorithm to Extract Moiré Fringe Phase for Wafer-Mask Alignment in Nanoimprint Lithography. MDPI AG.