Research on Nanometer Precision Measurement Method of High Order Even Aspheres
Optical aspheres are demanded with extremely high precision to meet functional requirements in space telescopes, extreme ultraviolet lithography, and other modern large optical systems. The nano-precision fabrication of optical aspheres requires high-precision measurements to guide deterministic opt...
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| Language: | English |
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MDPI AG
2024-10-01
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| Series: | Applied Sciences |
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| Online Access: | https://www.mdpi.com/2076-3417/14/21/9969 |
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| author | Hao Xu Junfeng Liu Shanyong Chen |
| author_facet | Hao Xu Junfeng Liu Shanyong Chen |
| author_sort | Hao Xu |
| collection | DOAJ |
| description | Optical aspheres are demanded with extremely high precision to meet functional requirements in space telescopes, extreme ultraviolet lithography, and other modern large optical systems. The nano-precision fabrication of optical aspheres requires high-precision measurements to guide deterministic optical processing. Null test is the preferred method for high-precision measurements. Null optics are required to compensate for the incident wavefront in the null test of optical aspheres. However, wavefront aberrations caused by the transmission flat or transmission sphere of interferometer and null optics can limit measurement accuracy and need to be separated. A nano-precision measurement method is proposed for the even optical aspheres of high order in this paper. A computer-generated hologram is used as a null optic to realize a null test on optical aspheres. Mapping distortion correction is performed on the measurement results to ensure that the transverse coordinates of the measurement results correspond correctly to those of the test surface. Absolute testing is applied to separate the wavefront aberrations caused by the computer-generated hologram and interferometer optics. Finally, the results obtained by this method were used to guide deterministic optical processing, enabling the nano-precision fabrication of optical aspheres. |
| format | Article |
| id | doaj-art-ad7b555f11f84f348801c0772bf1e8e0 |
| institution | Kabale University |
| issn | 2076-3417 |
| language | English |
| publishDate | 2024-10-01 |
| publisher | MDPI AG |
| record_format | Article |
| series | Applied Sciences |
| spelling | doaj-art-ad7b555f11f84f348801c0772bf1e8e02024-11-08T14:33:58ZengMDPI AGApplied Sciences2076-34172024-10-011421996910.3390/app14219969Research on Nanometer Precision Measurement Method of High Order Even AspheresHao Xu0Junfeng Liu1Shanyong Chen2National Key Laboratory of Equipment State Sensing and Smart Support, College of Intelligence Science and Technology, National University of Defense Technology, Changsha 410073, ChinaNational Key Laboratory of Equipment State Sensing and Smart Support, College of Intelligence Science and Technology, National University of Defense Technology, Changsha 410073, ChinaNational Key Laboratory of Equipment State Sensing and Smart Support, College of Intelligence Science and Technology, National University of Defense Technology, Changsha 410073, ChinaOptical aspheres are demanded with extremely high precision to meet functional requirements in space telescopes, extreme ultraviolet lithography, and other modern large optical systems. The nano-precision fabrication of optical aspheres requires high-precision measurements to guide deterministic optical processing. Null test is the preferred method for high-precision measurements. Null optics are required to compensate for the incident wavefront in the null test of optical aspheres. However, wavefront aberrations caused by the transmission flat or transmission sphere of interferometer and null optics can limit measurement accuracy and need to be separated. A nano-precision measurement method is proposed for the even optical aspheres of high order in this paper. A computer-generated hologram is used as a null optic to realize a null test on optical aspheres. Mapping distortion correction is performed on the measurement results to ensure that the transverse coordinates of the measurement results correspond correctly to those of the test surface. Absolute testing is applied to separate the wavefront aberrations caused by the computer-generated hologram and interferometer optics. Finally, the results obtained by this method were used to guide deterministic optical processing, enabling the nano-precision fabrication of optical aspheres.https://www.mdpi.com/2076-3417/14/21/9969interferometrynull testcomputer-generated hologramsoptical aspheres |
| spellingShingle | Hao Xu Junfeng Liu Shanyong Chen Research on Nanometer Precision Measurement Method of High Order Even Aspheres Applied Sciences interferometry null test computer-generated holograms optical aspheres |
| title | Research on Nanometer Precision Measurement Method of High Order Even Aspheres |
| title_full | Research on Nanometer Precision Measurement Method of High Order Even Aspheres |
| title_fullStr | Research on Nanometer Precision Measurement Method of High Order Even Aspheres |
| title_full_unstemmed | Research on Nanometer Precision Measurement Method of High Order Even Aspheres |
| title_short | Research on Nanometer Precision Measurement Method of High Order Even Aspheres |
| title_sort | research on nanometer precision measurement method of high order even aspheres |
| topic | interferometry null test computer-generated holograms optical aspheres |
| url | https://www.mdpi.com/2076-3417/14/21/9969 |
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