SELF-ASSEMBLY OF NANOSCALE POLYMER DOMAINS IN MICROSTRUCTURE TEMPLATE MADE BY AFM MICROMACHINING TECHNIQUE
A mixed top-down/bottom-up hierarchical method was introduced to manufacture massively aligned nanoscale domains’ arrays by using the self-assembly of asymmetrical poly（ styrene-block-ethylene/butylene’s-block-styrene）（ SEBS）triblock copolymers. Silicon substrates of assorted microstructure that is...
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| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | zho |
| Published: |
Editorial Office of Journal of Mechanical Strength
2019-01-01
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| Series: | Jixie qiangdu |
| Subjects: | |
| Online Access: | http://www.jxqd.net.cn/thesisDetails#10.16579/j.issn.1001.9669.2019.01.015 |
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| Summary: | A mixed top-down/bottom-up hierarchical method was introduced to manufacture massively aligned nanoscale domains’ arrays by using the self-assembly of asymmetrical poly（ styrene-block-ethylene/butylene’s-block-styrene）（ SEBS）triblock copolymers. Silicon substrates of assorted microstructure that is made by AFM that machines approach is used to template the ball-shaped and high-aspect-ratio cylindrical polymer domains’ alignment. The poly domains’ regular arrays were orientated via AFM micromachining technique’s introduction as an implement for dominating triblock copolymers’ self-assembly procedure locally by using the silicon substrate’s topography. This graph epitaxial methodology is exploitable in interbred hard/soft that is condensed substance systems for a variety of applications. Furthermore,pairing bottom-up and top-down methods is a bright,and perhaps basic,bridge between the parallel self-assembly of molecules and the morphological constraint of prevailing technology. |
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| ISSN: | 1001-9669 |