Capacitance of Film Structures Including Graphitic Carbon Nitride
Al/g-C3N4/Si/Al, Al/g-C3N4/SiO2/Si/Al, Al/g-C3N4/Al and Al/g-C3N4/Al2O3/Al structures were fabricated by rapid chemical vapor deposition of graphitic carbon nitride (g-C3N4) from melamine onto silicon (Si) and aluminum (Al) substrates partially coated with appropriate oxide – SiO2 or Al2O3 – and Al...
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| Main Authors: | , , , , |
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| Format: | Article |
| Language: | Russian |
| Published: |
Educational institution «Belarusian State University of Informatics and Radioelectronics»
2024-12-01
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| Series: | Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki |
| Subjects: | |
| Online Access: | https://doklady.bsuir.by/jour/article/view/4017 |
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