Formation of a Boron‐Oxide Termination for the (100) Diamond Surface

Formation of a Boron‐Oxide Termination for the (100) Diamond Surface

Abstract A boron‐oxide termination of the diamond (100) surface has been formed by depositing molecular boron oxide B2O3 onto the hydrogen‐terminated (100) diamond surface under ultrahigh vacuum conditions and annealing to 950 °C. The resulting termination is highly oriented and chemically homogeneo...

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Bibliographic Details
Main Authors: Alex K. Schenk, Rebecca Griffin, Anton Tadich, Daniel Roberts, Alastair Stacey
Format: Article
Language:English
Published: Wiley-VCH 2024-11-01
Series:Advanced Materials Interfaces
Subjects:
diamond heterointerfaces
diamond surface
photoelectron spectroscopy
surface science
Online Access:https://doi.org/10.1002/admi.202400208
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