Multi-Domain Data Integration for Plasma Diagnostics in Semiconductor Manufacturing Using Tri-CycleGAN

Multi-Domain Data Integration for Plasma Diagnostics in Semiconductor Manufacturing Using Tri-CycleGAN

The precise monitoring of chemical reactions in plasma-based processes is crucial for advanced semiconductor manufacturing. This study integrates three diagnostic techniques—Optical Emission Spectroscopy (OES), Quadrupole Mass Spectrometry (QMS), and Time-of-Flight Mass Spectrometry (ToF-MS)—into a...

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Bibliographic Details
Main Authors:	Minji Kang, Sung Kyu Jang, Jihun Kim, Seongho Kim, Changmin Kim, Hyo-Chang Lee, Wooseok Kang, Min Sup Choi, Hyeongkeun Kim, Hyeong-U Kim
Format:	Article
Language:	English
Published:	MDPI AG 2024-11-01
Series:	Journal of Sensor and Actuator Networks
Subjects:	plasma diagnostics reactive ion etching (RIE) semiconductor manufacturing machine learning cycle-consistent adversarial network (CycleGAN) multi-domain data integration
Online Access:	https://www.mdpi.com/2224-2708/13/6/75
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