Multi-Domain Data Integration for Plasma Diagnostics in Semiconductor Manufacturing Using Tri-CycleGAN

Multi-Domain Data Integration for Plasma Diagnostics in Semiconductor Manufacturing Using Tri-CycleGAN

The precise monitoring of chemical reactions in plasma-based processes is crucial for advanced semiconductor manufacturing. This study integrates three diagnostic techniques—Optical Emission Spectroscopy (OES), Quadrupole Mass Spectrometry (QMS), and Time-of-Flight Mass Spectrometry (ToF-MS)—into a...

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Bibliographic Details
Main Authors: Minji Kang, Sung Kyu Jang, Jihun Kim, Seongho Kim, Changmin Kim, Hyo-Chang Lee, Wooseok Kang, Min Sup Choi, Hyeongkeun Kim, Hyeong-U Kim
Format: Article
Language:English
Published: MDPI AG 2024-11-01
Series:Journal of Sensor and Actuator Networks
Subjects:
plasma diagnostics
reactive ion etching (RIE)
semiconductor manufacturing
machine learning
cycle-consistent adversarial network (CycleGAN)
multi-domain data integration
Online Access:https://www.mdpi.com/2224-2708/13/6/75
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