Topological Insulator Nanowires Made by AFM Nanopatterning: Fabrication Process and Ultra Low‐Temperature Transport Properties

Abstract Topological insulator nanostructures became an essential platform for studying novel fundamental effects emerging at the nanoscale. However, conventional nanopatterning techniques, based on electron beam lithography and reactive ion etching of films, have inherent limitations of edge precis...

Full description

Saved in:
Bibliographic Details
Main Authors: Dmitry S. Yakovlev, Aleksei V. Frolov, Ivan A. Nazhestkin, Alexei G. Temiryazev, Andrey P. Orlov, Jonathan Shvartzberg, Sergey E. Dizhur, Vladimir L. Gurtovoi, Razmik Hovhannisyan, Vasily S. Stolyarov
Format: Article
Language:English
Published: Wiley-VCH 2024-12-01
Series:Advanced Physics Research
Subjects:
Online Access:https://doi.org/10.1002/apxr.202400108
Tags: Add Tag
No Tags, Be the first to tag this record!