A Study on the High-Aspect-Ratio Oxide Etching Characteristics Using a Trifluoroiodomethane with a Low Global Warming Potential
In this study, high-aspect-ratio (HAR) oxide etching characteristics in inductively coupled plasma (ICP) was investigated using low frequency (2 MHz) bias power. For HAR oxide etching, a Trifluoroiodomethane (CF3I) with a low global warming potential of 1 was used, as an alternative gas for CF4 gas....
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| Format: | Article |
| Language: | English |
| Published: |
Taylor & Francis Group
2025-12-01
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| Series: | Journal of Chemical Engineering of Japan |
| Subjects: | |
| Online Access: | https://www.tandfonline.com/doi/10.1080/00219592.2025.2532109 |
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