TFT Backplanes Doped by BF2 Ion for Improved Stability and AMOLED Display Quality

Abstract This study investigates the effects of various ion implantation processes on the electrical performance of flexible low‐temperature polycrystalline silicon (LTPS) thin‐film transistor (TFT) backplanes. The introduction of BF2 ion implantation induces an additional shallow defect level near...

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Bibliographic Details
Main Authors: Ying Shen, Fa‐Hsyang Chen, Dongliang Yu, Xue Liu, Yinghai Ma, Xuyang Zhang, Feiyue Cheng, Xiujian Zhu, Xuecheng Zou
Format: Article
Language:English
Published: Wiley-VCH 2025-08-01
Series:Advanced Electronic Materials
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Online Access:https://doi.org/10.1002/aelm.202400989
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