TFT Backplanes Doped by BF2 Ion for Improved Stability and AMOLED Display Quality
Abstract This study investigates the effects of various ion implantation processes on the electrical performance of flexible low‐temperature polycrystalline silicon (LTPS) thin‐film transistor (TFT) backplanes. The introduction of BF2 ion implantation induces an additional shallow defect level near...
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| Main Authors: | , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Wiley-VCH
2025-08-01
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| Series: | Advanced Electronic Materials |
| Subjects: | |
| Online Access: | https://doi.org/10.1002/aelm.202400989 |
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