Magnetron Sputter Deposition of Amorphous Silicon–SiO2 Quantized Nanolaminates
Quantization effects in nanolaminate structures of oxide materials are proposed and experimentally demonstrated only recently. Herein, the material combination of amorphous silicon and SiO2 deposited by magnetron sputtering is investigated and it is shown that the quantization effect can be observed...
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| Main Authors: | , , , , , , , , |
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| Format: | Article |
| Language: | English |
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Wiley-VCH
2024-12-01
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| Series: | Advanced Photonics Research |
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| Online Access: | https://doi.org/10.1002/adpr.202400057 |
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| _version_ | 1846140112799268864 |
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| author | Silvia Schwyn Thöny Manuel Bärtschi Marietta Batzer Manuel Baselgia Raphael Gmünder Amit Sharma Tijmen Vermeij Xavier Maeder Stephan Waldner |
| author_facet | Silvia Schwyn Thöny Manuel Bärtschi Marietta Batzer Manuel Baselgia Raphael Gmünder Amit Sharma Tijmen Vermeij Xavier Maeder Stephan Waldner |
| author_sort | Silvia Schwyn Thöny |
| collection | DOAJ |
| description | Quantization effects in nanolaminate structures of oxide materials are proposed and experimentally demonstrated only recently. Herein, the material combination of amorphous silicon and SiO2 deposited by magnetron sputtering is investigated and it is shown that the quantization effect can be observed indeed. Transmission electron microscopy characterization gives evidence of continuous layers of amorphous silicon and SiO2 with well‐defined interfaces. The deposition process is described and the tunability of the refractive index and the bandgap energy is demonstrated. By doing so, the advantages of this novel material over classical optical materials are shown and feasibility is proved. As an example, a longpass optical interference filter with edge at 720 nm is deposited using quantized nanolaminates as the high and SiO2 as the low refractive index material. This filter can be deposited successfully with close match to the design. It shows a blocking range throughout the visible spectrum whereas a comparable filter based on SiO2–TiO2 only blocks 500–700 nm. |
| format | Article |
| id | doaj-art-2501373e964c4ba492e0d2aafe8d316e |
| institution | Kabale University |
| issn | 2699-9293 |
| language | English |
| publishDate | 2024-12-01 |
| publisher | Wiley-VCH |
| record_format | Article |
| series | Advanced Photonics Research |
| spelling | doaj-art-2501373e964c4ba492e0d2aafe8d316e2024-12-05T19:13:36ZengWiley-VCHAdvanced Photonics Research2699-92932024-12-01512n/an/a10.1002/adpr.202400057Magnetron Sputter Deposition of Amorphous Silicon–SiO2 Quantized NanolaminatesSilvia Schwyn Thöny0Manuel Bärtschi1Marietta Batzer2Manuel Baselgia3Raphael Gmünder4Amit Sharma5Tijmen Vermeij6Xavier Maeder7Stephan Waldner8Evatec AG Hauptstrasse 1a 9477 Trübbach SwitzerlandRhySearch Werdenbergstrasse 4 9471 Buchs SwitzerlandEvatec AG Hauptstrasse 1a 9477 Trübbach SwitzerlandEvatec AG Hauptstrasse 1a 9477 Trübbach SwitzerlandEvatec AG Hauptstrasse 1a 9477 Trübbach SwitzerlandLaboratory for Mechanics of Materials and Nanostructures Empa 3602 Thun SwitzerlandLaboratory for Mechanics of Materials and Nanostructures Empa 3602 Thun SwitzerlandLaboratory for Mechanics of Materials and Nanostructures Empa 3602 Thun SwitzerlandEvatec AG Hauptstrasse 1a 9477 Trübbach SwitzerlandQuantization effects in nanolaminate structures of oxide materials are proposed and experimentally demonstrated only recently. Herein, the material combination of amorphous silicon and SiO2 deposited by magnetron sputtering is investigated and it is shown that the quantization effect can be observed indeed. Transmission electron microscopy characterization gives evidence of continuous layers of amorphous silicon and SiO2 with well‐defined interfaces. The deposition process is described and the tunability of the refractive index and the bandgap energy is demonstrated. By doing so, the advantages of this novel material over classical optical materials are shown and feasibility is proved. As an example, a longpass optical interference filter with edge at 720 nm is deposited using quantized nanolaminates as the high and SiO2 as the low refractive index material. This filter can be deposited successfully with close match to the design. It shows a blocking range throughout the visible spectrum whereas a comparable filter based on SiO2–TiO2 only blocks 500–700 nm.https://doi.org/10.1002/adpr.202400057bandgaplow‐loss coatingmagnetron sputteringmeta materialsoptical thin filmsquantized nanolaminates |
| spellingShingle | Silvia Schwyn Thöny Manuel Bärtschi Marietta Batzer Manuel Baselgia Raphael Gmünder Amit Sharma Tijmen Vermeij Xavier Maeder Stephan Waldner Magnetron Sputter Deposition of Amorphous Silicon–SiO2 Quantized Nanolaminates Advanced Photonics Research bandgap low‐loss coating magnetron sputtering meta materials optical thin films quantized nanolaminates |
| title | Magnetron Sputter Deposition of Amorphous Silicon–SiO2 Quantized Nanolaminates |
| title_full | Magnetron Sputter Deposition of Amorphous Silicon–SiO2 Quantized Nanolaminates |
| title_fullStr | Magnetron Sputter Deposition of Amorphous Silicon–SiO2 Quantized Nanolaminates |
| title_full_unstemmed | Magnetron Sputter Deposition of Amorphous Silicon–SiO2 Quantized Nanolaminates |
| title_short | Magnetron Sputter Deposition of Amorphous Silicon–SiO2 Quantized Nanolaminates |
| title_sort | magnetron sputter deposition of amorphous silicon sio2 quantized nanolaminates |
| topic | bandgap low‐loss coating magnetron sputtering meta materials optical thin films quantized nanolaminates |
| url | https://doi.org/10.1002/adpr.202400057 |
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