Combinatorial Optimization of Metal‐Insulator‐Insulator‐Metal (MIIM) Diodes With Thickness‐Gradient Films via Spatial Atomic Layer Deposition

Combinatorial Optimization of Metal‐Insulator‐Insulator‐Metal (MIIM) Diodes With Thickness‐Gradient Films via Spatial Atomic Layer Deposition

Abstract Metal‐insulator‐insulator‐metal (MIIM) diodes with thickness‐gradient films for the insulator layers are fabricated for the first time. Spatially varying atmospheric‐pressure chemical vapor deposition is used to deposit ZnO and Al2O3 films with orthogonal gradient directions, producing 414...

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Bibliographic Details
Main Authors: Abdullah H. Alshehri, Hatameh Asgarimoghaddam, Louis‐Vincent Delumeau, Viet Huong Nguyen, AlRasheed Ali, Mutabe Aljaghtham, Ali Alamry, Dogu Ozyigit, Mustafa Yavuz, Kevin P. Musselman
Format: Article
Language:English
Published: Wiley-VCH 2024-11-01
Series:Advanced Electronic Materials
Subjects:
chemical vapor deposition
combinatorial studies
high‐throughput optimization
metal‐insulator‐insulator‐metal diodes
spatial atomic layer deposition
thickness gradient films
Online Access:https://doi.org/10.1002/aelm.202400093
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https://doi.org/10.1002/aelm.202400093

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