Pattern distortion in nanoimprint lithography using UV-curable polymer stamps

Pattern distortion in nanoimprint lithography using UV-curable polymer stamps

Quantification of pattern distortion in nanoimprint lithography (NIL) is required when applying it to specific applications, especially those with tight tolerances. We present a systematic study on full wafer NIL distortion using soft stamps made of different carrier foils and UV-curable polymer str...

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Bibliographic Details
Main Authors: Fangfang Li, Marina Fetisova, Mervi Koskinen, Jukka Viheriälä, Tapio Niemi, Petri Karvinen, Markku Kuittinen
Format: Article
Language:English
Published: Elsevier 2024-12-01
Series:Micro and Nano Engineering
Subjects:
Nanoimprint lithography
Optical lithography
Soft stamps
Pattern distortion
Placement error
Online Access:http://www.sciencedirect.com/science/article/pii/S259000722400056X
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http://www.sciencedirect.com/science/article/pii/S259000722400056X

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