Crystal structure modulating performances for 213-nm GeO2 solar-blind photodetectors via DC reactive magnetron sputtering method by Chengming Wei, Jiabao Liu, Xinru Lan, Cheng Yang, Shuiping Huang, Dongdong Meng, Zhengwei Chen, Hongguang Duan, Xu Wang

“…On the foundation of these ultra-wide bandgap semiconductors, obvious photoresponse characteristics have been achieved at 213 nm and the quartz-GeO2 device exhibits better performances including a short fall time of 148.5 ms, a high photo-dark current ratio of 86.65, large photoresponsivity of 4.56 A/W, and high detectivity of 6.78 × 1013 Jones, which can be attributed to the less oxygen defect exists in the quartz-GeO2 film due to the oxygen-rich growth condition and the better lattice matching with sapphire. …”
Get full text