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Different Nucleation Mechanisms during Atomic Layer Deposition of HfS2 on Cobalt Oxide Surfaces
Published 2025-01-01Subjects: Get full text
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Different temperatures leakage mechanisms of (Al2O3)x(HfO2)1−x gate Dielectrics deposited by atomic layer deposition
Published 2025-01-01Subjects: “…(Al2O3)x(HfO2)1−x…”
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