Thermal Stability of Schottky Contacts and Rearrangement of Defects in β‐Ga2O3 Crystals

Abstract The thermal stability of different Schottky contacts (Au, Pt, and Ni) on (100) β‐Ga2O3 single crystals grown by the Czochralski method is investigated. Besides the examination of the Schottky barrier parameters, contact‐dependent defect levels are investigated by deep‐level transient spectr...

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Main Authors: Palvan Seyidov, Joel B. Varley, Ymir Kalmann Frodason, Detlef Klimm, Lasse Vines, Zbigniew Galazka, Ta‐Shun Chou, Andreas Popp, Klaus Irmscher, Andreas Fiedler
Format: Article
Language:English
Published: Wiley-VCH 2025-01-01
Series:Advanced Electronic Materials
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Online Access:https://doi.org/10.1002/aelm.202300428
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author Palvan Seyidov
Joel B. Varley
Ymir Kalmann Frodason
Detlef Klimm
Lasse Vines
Zbigniew Galazka
Ta‐Shun Chou
Andreas Popp
Klaus Irmscher
Andreas Fiedler
author_facet Palvan Seyidov
Joel B. Varley
Ymir Kalmann Frodason
Detlef Klimm
Lasse Vines
Zbigniew Galazka
Ta‐Shun Chou
Andreas Popp
Klaus Irmscher
Andreas Fiedler
author_sort Palvan Seyidov
collection DOAJ
description Abstract The thermal stability of different Schottky contacts (Au, Pt, and Ni) on (100) β‐Ga2O3 single crystals grown by the Czochralski method is investigated. Besides the examination of the Schottky barrier parameters, contact‐dependent defect levels are investigated by deep‐level transient spectroscopy (DLTS) in a 100–650 K (ramp‐up) and 650–100 K (ramp‐down) temperature cycle. Several defect levels are detected below the conduction band minimum at 0.41, 0.60, 0.77, 0.96, and 1.17 eV. In the temperature ramp‐down DLTS, the 1.17 eV level disappears, and the 0.60 eV level appears for all Schottky contacts. DFT calculations suggest that rearrangement and dissociation of a single hydrogen from a doubly‐hydrogenated Ga─O divacancy complex occurs during the temperature sweep under bias. The trap level at 0.96 eV only appears after the thermal load for the Ni contact, in contrast to Au and Pt, where it is present without a thermal budget. Temperature‐dependent leakage current (at −4 V) measurements indicate oxidation of Ni, and further thermodynamic analysis suggests alloying of Au‐Ga atoms at the Au/β‐Ga2O3 interface. These studies provide insight into the behavior induced by these common Schottky contacts and the alteration associated with temperature cycling.
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spelling doaj-art-ed1152d872c445889ec109cf681cbd472025-01-10T13:40:16ZengWiley-VCHAdvanced Electronic Materials2199-160X2025-01-01111n/an/a10.1002/aelm.202300428Thermal Stability of Schottky Contacts and Rearrangement of Defects in β‐Ga2O3 CrystalsPalvan Seyidov0Joel B. Varley1Ymir Kalmann Frodason2Detlef Klimm3Lasse Vines4Zbigniew Galazka5Ta‐Shun Chou6Andreas Popp7Klaus Irmscher8Andreas Fiedler9Leibniz‐Institut für Kristallzüchtung 12489 Berlin GermanyLawrence Livermore National Laboratory Livermore CA 94550 USADepartment of Physics/Centre for Materials Science and Nanotechnology University of Oslo Oslo N‐0316 NorwayLeibniz‐Institut für Kristallzüchtung 12489 Berlin GermanyDepartment of Physics/Centre for Materials Science and Nanotechnology University of Oslo Oslo N‐0316 NorwayLeibniz‐Institut für Kristallzüchtung 12489 Berlin GermanyLeibniz‐Institut für Kristallzüchtung 12489 Berlin GermanyLeibniz‐Institut für Kristallzüchtung 12489 Berlin GermanyLeibniz‐Institut für Kristallzüchtung 12489 Berlin GermanyLeibniz‐Institut für Kristallzüchtung 12489 Berlin GermanyAbstract The thermal stability of different Schottky contacts (Au, Pt, and Ni) on (100) β‐Ga2O3 single crystals grown by the Czochralski method is investigated. Besides the examination of the Schottky barrier parameters, contact‐dependent defect levels are investigated by deep‐level transient spectroscopy (DLTS) in a 100–650 K (ramp‐up) and 650–100 K (ramp‐down) temperature cycle. Several defect levels are detected below the conduction band minimum at 0.41, 0.60, 0.77, 0.96, and 1.17 eV. In the temperature ramp‐down DLTS, the 1.17 eV level disappears, and the 0.60 eV level appears for all Schottky contacts. DFT calculations suggest that rearrangement and dissociation of a single hydrogen from a doubly‐hydrogenated Ga─O divacancy complex occurs during the temperature sweep under bias. The trap level at 0.96 eV only appears after the thermal load for the Ni contact, in contrast to Au and Pt, where it is present without a thermal budget. Temperature‐dependent leakage current (at −4 V) measurements indicate oxidation of Ni, and further thermodynamic analysis suggests alloying of Au‐Ga atoms at the Au/β‐Ga2O3 interface. These studies provide insight into the behavior induced by these common Schottky contacts and the alteration associated with temperature cycling.https://doi.org/10.1002/aelm.202300428defectsDFTgallium oxideSchottky contactthermal stability
spellingShingle Palvan Seyidov
Joel B. Varley
Ymir Kalmann Frodason
Detlef Klimm
Lasse Vines
Zbigniew Galazka
Ta‐Shun Chou
Andreas Popp
Klaus Irmscher
Andreas Fiedler
Thermal Stability of Schottky Contacts and Rearrangement of Defects in β‐Ga2O3 Crystals
Advanced Electronic Materials
defects
DFT
gallium oxide
Schottky contact
thermal stability
title Thermal Stability of Schottky Contacts and Rearrangement of Defects in β‐Ga2O3 Crystals
title_full Thermal Stability of Schottky Contacts and Rearrangement of Defects in β‐Ga2O3 Crystals
title_fullStr Thermal Stability of Schottky Contacts and Rearrangement of Defects in β‐Ga2O3 Crystals
title_full_unstemmed Thermal Stability of Schottky Contacts and Rearrangement of Defects in β‐Ga2O3 Crystals
title_short Thermal Stability of Schottky Contacts and Rearrangement of Defects in β‐Ga2O3 Crystals
title_sort thermal stability of schottky contacts and rearrangement of defects in β ga2o3 crystals
topic defects
DFT
gallium oxide
Schottky contact
thermal stability
url https://doi.org/10.1002/aelm.202300428
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