High-voltage FinFET with floating poly and high-k material for enhanced intrinsic gain and safe operating area

Abstract We propose a new drain-extended FinFET (DeFinFET) that can improve the intrinsic gain (g m/g ds) and the electrical safe operating area (SOA). This structure features a novel utilization of the drain potential by using a floating poly (FP) and split high-k material (HK) on the drain and dri...

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Bibliographic Details
Main Authors: Kyounghwan Oh, Hyangwoo Kim, Yijoon Kim, Hyeongseok Yoo, Minkeun Choi, Wooyeol Maeng, Sutae Kim, Hyung-Jin Lee, Chang-Ki Baek
Format: Article
Language:English
Published: Nature Portfolio 2024-11-01
Series:Scientific Reports
Online Access:https://doi.org/10.1038/s41598-024-79881-3
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