Tailoring Nickel Oxide Thin Films: Comparative Study of Oxidizing Agents in Thermal and Plasma-Enhanced Atomic Layer Deposition

Tailoring Nickel Oxide Thin Films: Comparative Study of Oxidizing Agents in Thermal and Plasma-Enhanced Atomic Layer Deposition

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Bibliographic Details
Main Authors:	Mario Alberto Hidrogo-Rico, Nicola Nedev, Paul Horley, María Isabel Mendívil, Jhonathan Castillo-Saenz, Edgar Martínez-Guerra, Emilio J. Juarez-Perez, Francisco Servando Aguirre-Tostado, Arturo Susarrey-Arce, Eduardo Martínez-Guerra
Format:	Article
Language:	English
Published:	American Chemical Society 2024-12-01
Series:	ACS Omega
Online Access:	https://doi.org/10.1021/acsomega.4c06606
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