Tailoring Nickel Oxide Thin Films: Comparative Study of Oxidizing Agents in Thermal and Plasma-Enhanced Atomic Layer Deposition - Mario Alberto Hidrogo-Rico; Nicola Nedev; Paul Horley; María Isabel Mendívil; Jhonathan Castillo-Saenz; Edgar Martínez-Guerra; Emilio J. Juarez-Perez; Francisco Servando Aguirre-Tostado; Arturo Susarrey-Arce; Eduardo Martínez-Guerra (ACS Omega)