Research on the Isolation Technology for Reverse Conducting IGCT

Isolation between GCT and FRD is the key technology in reverse conducting IGCT (RC_IGCT) developing. Compared with the existing isolation technology, a new method with compensated PNP isolation structure was proposed. Based on Silvaco simulation, process experiment and certification test were carrie...

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Main Authors: CHEN Fanglin, WU Yudong, ZHANG Ming, TANG Longgu, CHEN Yongmin, GAO Jianning
Format: Article
Language:zho
Published: Editorial Office of Control and Information Technology 2015-01-01
Series:Kongzhi Yu Xinxi Jishu
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Online Access:http://ctet.csrzic.com/thesisDetails#10.13889/j.issn.2095-3631.2015.01.007
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author CHEN Fanglin
WU Yudong
ZHANG Ming
TANG Longgu
CHEN Yongmin
GAO Jianning
author_facet CHEN Fanglin
WU Yudong
ZHANG Ming
TANG Longgu
CHEN Yongmin
GAO Jianning
author_sort CHEN Fanglin
collection DOAJ
description Isolation between GCT and FRD is the key technology in reverse conducting IGCT (RC_IGCT) developing. Compared with the existing isolation technology, a new method with compensated PNP isolation structure was proposed. Based on Silvaco simulation, process experiment and certification test were carried out on RC_GCTs wafers with 4 "and 6" substrates. The results show that the new method can increase the isolation voltage and reduce the difficulties both in the design and process.
format Article
id doaj-art-d04fc37fce994476b4a181a1b88846e1
institution Kabale University
issn 2096-5427
language zho
publishDate 2015-01-01
publisher Editorial Office of Control and Information Technology
record_format Article
series Kongzhi Yu Xinxi Jishu
spelling doaj-art-d04fc37fce994476b4a181a1b88846e12025-08-25T06:55:25ZzhoEditorial Office of Control and Information TechnologyKongzhi Yu Xinxi Jishu2096-54272015-01-01313582332331Research on the Isolation Technology for Reverse Conducting IGCTCHEN FanglinWU YudongZHANG MingTANG LongguCHEN YongminGAO JianningIsolation between GCT and FRD is the key technology in reverse conducting IGCT (RC_IGCT) developing. Compared with the existing isolation technology, a new method with compensated PNP isolation structure was proposed. Based on Silvaco simulation, process experiment and certification test were carried out on RC_GCTs wafers with 4 "and 6" substrates. The results show that the new method can increase the isolation voltage and reduce the difficulties both in the design and process.http://ctet.csrzic.com/thesisDetails#10.13889/j.issn.2095-3631.2015.01.007IGCTGCTreverse conductFRDisolation
spellingShingle CHEN Fanglin
WU Yudong
ZHANG Ming
TANG Longgu
CHEN Yongmin
GAO Jianning
Research on the Isolation Technology for Reverse Conducting IGCT
Kongzhi Yu Xinxi Jishu
IGCT
GCT
reverse conduct
FRD
isolation
title Research on the Isolation Technology for Reverse Conducting IGCT
title_full Research on the Isolation Technology for Reverse Conducting IGCT
title_fullStr Research on the Isolation Technology for Reverse Conducting IGCT
title_full_unstemmed Research on the Isolation Technology for Reverse Conducting IGCT
title_short Research on the Isolation Technology for Reverse Conducting IGCT
title_sort research on the isolation technology for reverse conducting igct
topic IGCT
GCT
reverse conduct
FRD
isolation
url http://ctet.csrzic.com/thesisDetails#10.13889/j.issn.2095-3631.2015.01.007
work_keys_str_mv AT chenfanglin researchontheisolationtechnologyforreverseconductingigct
AT wuyudong researchontheisolationtechnologyforreverseconductingigct
AT zhangming researchontheisolationtechnologyforreverseconductingigct
AT tanglonggu researchontheisolationtechnologyforreverseconductingigct
AT chenyongmin researchontheisolationtechnologyforreverseconductingigct
AT gaojianning researchontheisolationtechnologyforreverseconductingigct