Barrier Inhomogeneity of Pt/GaN Junctions with a Low-Temperature ALD Grown ZnO Interlayer

Semiconducting GaN can realize high performance electronic and power devices owing to its high electron mobility and thermal conductivity where good metal-semiconductor contact is prerequisite. In this work, using thermal atomic layer deposition (ALD), ZnO interlayer was grown at 80°C on GaN and the...

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Main Authors: Hogyoung Kim, Ye Bin Won, Byung Joon Choi
Format: Article
Language:English
Published: Polish Academy of Sciences 2024-06-01
Series:Archives of Metallurgy and Materials
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Online Access:https://journals.pan.pl/Content/131843/AMM-2024-2-14-Byung%20Joon%20Choi.pdf
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author Hogyoung Kim
Ye Bin Won
Byung Joon Choi
author_facet Hogyoung Kim
Ye Bin Won
Byung Joon Choi
author_sort Hogyoung Kim
collection DOAJ
description Semiconducting GaN can realize high performance electronic and power devices owing to its high electron mobility and thermal conductivity where good metal-semiconductor contact is prerequisite. In this work, using thermal atomic layer deposition (ALD), ZnO interlayer was grown at 80°C on GaN and the Pt/ZnO/GaN heterojunctions were electrically characterized. The analyses on the current–voltage (I–V) and capacitance (C–V) data showed that the forward I–V conduction was involved with the inhomogeneous Schottky barrier. The higher density of interface states from I–V data than that from C–V data was attributed to nonuniform distribution of interface states. In addition, high density of interface states caused localized high electric field, caused higher Poole Frenkel emission coefficients than the theoretical one.
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institution Kabale University
issn 2300-1909
language English
publishDate 2024-06-01
publisher Polish Academy of Sciences
record_format Article
series Archives of Metallurgy and Materials
spelling doaj-art-c93f3d1f1ab74fd2a1f695e3246c190d2024-12-27T14:07:46ZengPolish Academy of SciencesArchives of Metallurgy and Materials2300-19092024-06-01vol. 69No 2459463https://doi.org/10.24425/amm.2024.149766Barrier Inhomogeneity of Pt/GaN Junctions with a Low-Temperature ALD Grown ZnO InterlayerHogyoung Kim0https://orcid.org/0000-0003-0066-2584Ye Bin Won1https://orcid.org/0000-0003-1880-4333Byung Joon Choi2https://orcid.org/0000-0003-1920-8162Seoul National University of Science and Technology, Department of Visual Optics, Seoul 01811, KoreaSeoul National University of Science and Technology, Department of Material Science and Engineering, Seoul 01811, KoreaSeoul National University of Science and Technology, Department of Material Science and Engineering, Seoul 01811, KoreaSemiconducting GaN can realize high performance electronic and power devices owing to its high electron mobility and thermal conductivity where good metal-semiconductor contact is prerequisite. In this work, using thermal atomic layer deposition (ALD), ZnO interlayer was grown at 80°C on GaN and the Pt/ZnO/GaN heterojunctions were electrically characterized. The analyses on the current–voltage (I–V) and capacitance (C–V) data showed that the forward I–V conduction was involved with the inhomogeneous Schottky barrier. The higher density of interface states from I–V data than that from C–V data was attributed to nonuniform distribution of interface states. In addition, high density of interface states caused localized high electric field, caused higher Poole Frenkel emission coefficients than the theoretical one.https://journals.pan.pl/Content/131843/AMM-2024-2-14-Byung%20Joon%20Choi.pdfzno interlayerganinhomogeneous schottky barrierinterface states
spellingShingle Hogyoung Kim
Ye Bin Won
Byung Joon Choi
Barrier Inhomogeneity of Pt/GaN Junctions with a Low-Temperature ALD Grown ZnO Interlayer
Archives of Metallurgy and Materials
zno interlayer
gan
inhomogeneous schottky barrier
interface states
title Barrier Inhomogeneity of Pt/GaN Junctions with a Low-Temperature ALD Grown ZnO Interlayer
title_full Barrier Inhomogeneity of Pt/GaN Junctions with a Low-Temperature ALD Grown ZnO Interlayer
title_fullStr Barrier Inhomogeneity of Pt/GaN Junctions with a Low-Temperature ALD Grown ZnO Interlayer
title_full_unstemmed Barrier Inhomogeneity of Pt/GaN Junctions with a Low-Temperature ALD Grown ZnO Interlayer
title_short Barrier Inhomogeneity of Pt/GaN Junctions with a Low-Temperature ALD Grown ZnO Interlayer
title_sort barrier inhomogeneity of pt gan junctions with a low temperature ald grown zno interlayer
topic zno interlayer
gan
inhomogeneous schottky barrier
interface states
url https://journals.pan.pl/Content/131843/AMM-2024-2-14-Byung%20Joon%20Choi.pdf
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AT yebinwon barrierinhomogeneityofptganjunctionswithalowtemperaturealdgrownznointerlayer
AT byungjoonchoi barrierinhomogeneityofptganjunctionswithalowtemperaturealdgrownznointerlayer