Wu, X., Oropeza, F. E., Chang, S., Einert, M., Wu, Q., Maheu, C., . . . Hofmann, J. P. Promoting effect of interfacial hole accumulation on photoelectrochemical water oxidation in BiVO4 and Mo-doped BiVO4. KeAi Communications Co. Ltd.
Chicago Style (17th ed.) CitationWu, Xiaofeng, et al. Promoting Effect of Interfacial Hole Accumulation on Photoelectrochemical Water Oxidation in BiVO4 and Mo-doped BiVO4. KeAi Communications Co. Ltd.
MLA (9th ed.) CitationWu, Xiaofeng, et al. Promoting Effect of Interfacial Hole Accumulation on Photoelectrochemical Water Oxidation in BiVO4 and Mo-doped BiVO4. KeAi Communications Co. Ltd.
Warning: These citations may not always be 100% accurate.