Repetition Frequency-Dependent Formation of Oxidized LIPSSs on Amorphous Silicon Films

Laser-induced periodic surface structures (LIPSSs) produced via ultrafast laser-induced oxidation offer a promising route for high-quality nanostructuring, with reduced thermal damage compared to conventional ablation-based methods. However, the influence of laser repetition frequency on the formati...

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Main Authors: Liye Xu, Wei Yan, Weicheng Cui, Min Qiu
Format: Article
Language:English
Published: MDPI AG 2025-07-01
Series:Photonics
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Online Access:https://www.mdpi.com/2304-6732/12/7/667
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_version_ 1849251799070932992
author Liye Xu
Wei Yan
Weicheng Cui
Min Qiu
author_facet Liye Xu
Wei Yan
Weicheng Cui
Min Qiu
author_sort Liye Xu
collection DOAJ
description Laser-induced periodic surface structures (LIPSSs) produced via ultrafast laser-induced oxidation offer a promising route for high-quality nanostructuring, with reduced thermal damage compared to conventional ablation-based methods. However, the influence of laser repetition frequency on the formation and morphology of oxidized LIPSSs remains insufficiently explored. In this study, we systematically investigate the effects of varying the femtosecond laser repetition frequency from 1 kHz to 100 kHz while keeping the total pulse number constant on the oxidation-induced LIPSSs formed on amorphous silicon films. Scanning electron microscopy and Fourier analysis reveal a transition between two morphological regimes with increasing repetition frequency: at low frequencies, the long inter-pulse intervals result in irregular, disordered oxidation patterns; at high frequencies, closely spaced pulses promote the formation of highly ordered, periodic surface structures. Statistical measurements show that the laser-modified area decreases with frequency, while the LIPSS period remains relatively stable and the ridge width exhibits a peak at 10 kHz. Finite-difference time-domain (FDTD) and finite-element simulations suggest that the observed patterns result from a dynamic balance between light-field modulation and oxidation kinetics, rather than thermal accumulation. These findings advance the understanding of oxidation-driven LIPSS formation dynamics and provide guidance for optimizing femtosecond laser parameters for precise surface nanopatterning.
format Article
id doaj-art-b2ee21e7ba974dc1b8ee0cd3185eecd0
institution Kabale University
issn 2304-6732
language English
publishDate 2025-07-01
publisher MDPI AG
record_format Article
series Photonics
spelling doaj-art-b2ee21e7ba974dc1b8ee0cd3185eecd02025-08-20T03:56:49ZengMDPI AGPhotonics2304-67322025-07-0112766710.3390/photonics12070667Repetition Frequency-Dependent Formation of Oxidized LIPSSs on Amorphous Silicon FilmsLiye Xu0Wei Yan1Weicheng Cui2Min Qiu3College of Information Science and Electronic Engineering, Zhejiang University, Hangzhou 310058, ChinaZhejiang Key Laboratory of 3D Micro/Nano Fabrication and Characterization, Department of Electronic and Information Engineering, School of Engineering, Westlake University, Hangzhou 310030, ChinaZhejiang Key Laboratory of 3D Micro/Nano Fabrication and Characterization, Department of Electronic and Information Engineering, School of Engineering, Westlake University, Hangzhou 310030, ChinaZhejiang Key Laboratory of 3D Micro/Nano Fabrication and Characterization, Department of Electronic and Information Engineering, School of Engineering, Westlake University, Hangzhou 310030, ChinaLaser-induced periodic surface structures (LIPSSs) produced via ultrafast laser-induced oxidation offer a promising route for high-quality nanostructuring, with reduced thermal damage compared to conventional ablation-based methods. However, the influence of laser repetition frequency on the formation and morphology of oxidized LIPSSs remains insufficiently explored. In this study, we systematically investigate the effects of varying the femtosecond laser repetition frequency from 1 kHz to 100 kHz while keeping the total pulse number constant on the oxidation-induced LIPSSs formed on amorphous silicon films. Scanning electron microscopy and Fourier analysis reveal a transition between two morphological regimes with increasing repetition frequency: at low frequencies, the long inter-pulse intervals result in irregular, disordered oxidation patterns; at high frequencies, closely spaced pulses promote the formation of highly ordered, periodic surface structures. Statistical measurements show that the laser-modified area decreases with frequency, while the LIPSS period remains relatively stable and the ridge width exhibits a peak at 10 kHz. Finite-difference time-domain (FDTD) and finite-element simulations suggest that the observed patterns result from a dynamic balance between light-field modulation and oxidation kinetics, rather than thermal accumulation. These findings advance the understanding of oxidation-driven LIPSS formation dynamics and provide guidance for optimizing femtosecond laser parameters for precise surface nanopatterning.https://www.mdpi.com/2304-6732/12/7/667oxidized LIPSSsrepetition frequencyamorphous silicon
spellingShingle Liye Xu
Wei Yan
Weicheng Cui
Min Qiu
Repetition Frequency-Dependent Formation of Oxidized LIPSSs on Amorphous Silicon Films
Photonics
oxidized LIPSSs
repetition frequency
amorphous silicon
title Repetition Frequency-Dependent Formation of Oxidized LIPSSs on Amorphous Silicon Films
title_full Repetition Frequency-Dependent Formation of Oxidized LIPSSs on Amorphous Silicon Films
title_fullStr Repetition Frequency-Dependent Formation of Oxidized LIPSSs on Amorphous Silicon Films
title_full_unstemmed Repetition Frequency-Dependent Formation of Oxidized LIPSSs on Amorphous Silicon Films
title_short Repetition Frequency-Dependent Formation of Oxidized LIPSSs on Amorphous Silicon Films
title_sort repetition frequency dependent formation of oxidized lipsss on amorphous silicon films
topic oxidized LIPSSs
repetition frequency
amorphous silicon
url https://www.mdpi.com/2304-6732/12/7/667
work_keys_str_mv AT liyexu repetitionfrequencydependentformationofoxidizedlipsssonamorphoussiliconfilms
AT weiyan repetitionfrequencydependentformationofoxidizedlipsssonamorphoussiliconfilms
AT weichengcui repetitionfrequencydependentformationofoxidizedlipsssonamorphoussiliconfilms
AT minqiu repetitionfrequencydependentformationofoxidizedlipsssonamorphoussiliconfilms