Low-temperature fabrication of plasmonic titanium nitride thin films by electron beam evaporation

Low-temperature fabrication of plasmonic titanium nitride thin films by electron beam evaporation

Titanium nitride (TiN) is a refractory metal nitride compound with the potential to function as an alternative plasmonic material to gold, especially for high-power linear and nonlinear applications such as materials processing, telecommunications, and laser systems. This paper presents a simple, el...

Full description

Saved in:
Bibliographic Details
Main Authors: Anindita Das, Yoshiko Nanao, Akhil Rajan, Andrea Di Falco, Sebastian A Schulz
Format: Article
Language:English
Published: IOP Publishing 2025-01-01
Series:JPhys Photonics
Subjects:
titanium nitride
electron beam evaporation
refractory material
plasmonics
Online Access:https://doi.org/10.1088/2515-7647/adcddc
Tags: Add Tag
No Tags, Be the first to tag this record!

Similar Items

Similar Items