Pulsed laser deposition OF III-V semiconductor thin films: review
This review highlights the latest advancements in pulsed laser deposition of III-V semiconductor thin films on various substrates. The pulsed laser deposition method is shown to be highly effective and distinct from other thin film deposition techniques due to its discrete nature. Epitaxial growth o...
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| Main Author: | |
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| Format: | Article |
| Language: | Russian |
| Published: |
Tver State University
2024-12-01
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| Series: | Физико-химические аспекты изучения кластеров, наноструктур и наноматериалов |
| Subjects: | |
| Online Access: | https://physchemaspects.ru/2024/doi-10-26456-pcascnn-2024-16-621/?lang=en |
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