Release of hydrogen gas from PECVD silicon nitride thin films in cavities of MEMS sensors

Release of hydrogen gas from PECVD silicon nitride thin films in cavities of MEMS sensors

In this work we investigate the release of hydrogen gas from PECVD silicon nitride thin films in the cavities of MEMS based inertial sensors. Firstly, material characterization is conducted on two types of PECVD silicon nitride thin films to study the release of hydrogen gas with analytical methods....

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Bibliographic Details
Main Authors: P. Dani, M. Tuchen, B.E. Meli, J. Franz, J. Knoch
Format: Article
Language:English
Published: Elsevier 2024-12-01
Series:Micro and Nano Engineering
Subjects:
MEMS
Cavity pressure
Hydrogen
PECVD
Diffusion
Online Access:http://www.sciencedirect.com/science/article/pii/S2590007224000546
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