A non-pyrophoric precursor for the low temperature deposition of metallic aluminium
Abstract The development of microelectronics prompts a search for precursors that can deposit conductive features. There is scarce research on Al as it is normally deposited using pyrophoric AlH3 etherates/aminates. Ligands can impart increased stability while maintaining the ability to deposit targ...
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| Format: | Article |
| Language: | English |
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Nature Portfolio
2025-07-01
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| Series: | Nature Communications |
| Online Access: | https://doi.org/10.1038/s41467-025-60786-2 |
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| author | Erica N. Faria Samuel P. Douglas Shreya Mrig Leonardo Santoni Adam J. Clancy Daniel W. N. Wilson Caroline E. Knapp |
| author_facet | Erica N. Faria Samuel P. Douglas Shreya Mrig Leonardo Santoni Adam J. Clancy Daniel W. N. Wilson Caroline E. Knapp |
| author_sort | Erica N. Faria |
| collection | DOAJ |
| description | Abstract The development of microelectronics prompts a search for precursors that can deposit conductive features. There is scarce research on Al as it is normally deposited using pyrophoric AlH3 etherates/aminates. Ligands can impart increased stability while maintaining the ability to deposit target materials. Accordingly, we have engineered an aluminium complex that can undergo conversion to Al(0) at 100 °C. Our multi-step synthetic design features β-ketoiminate compounds, [Al(R-ketoiminate)2Cl] (R = Me, Et, i Pr, Ph and Mes, 1-5) as starting materials to obtain aluminium hydride complexes: the polymeric amidoalane Li[AlH2( i Pr-Hacnac)AlH3]n (6) and the imidoalane cluster [AlH2AlH2(N-Mes)3(AlH2 ּ Li(Et2O)2)2] (8). Decomposition of 8 into aluminium metal is observed when heated under vacuum at 100 °C and is confirmed by XRD, TEM, XPS. Deposition of a highly conductive film of Al is achieved from 8 after three weeks under nitrogen at room temperature. This represents a route to metallic aluminium involving non-pyrophoric precursors at low temperatures. |
| format | Article |
| id | doaj-art-8b030f2364d444e7bb98b17879d63fb3 |
| institution | Kabale University |
| issn | 2041-1723 |
| language | English |
| publishDate | 2025-07-01 |
| publisher | Nature Portfolio |
| record_format | Article |
| series | Nature Communications |
| spelling | doaj-art-8b030f2364d444e7bb98b17879d63fb32025-08-20T04:01:36ZengNature PortfolioNature Communications2041-17232025-07-011611710.1038/s41467-025-60786-2A non-pyrophoric precursor for the low temperature deposition of metallic aluminiumErica N. Faria0Samuel P. Douglas1Shreya Mrig2Leonardo Santoni3Adam J. Clancy4Daniel W. N. Wilson5Caroline E. Knapp6Department of Chemistry, University College LondonDepartment of Chemistry, University College LondonDepartment of Chemistry, University College LondonDepartment of Chemistry, University College LondonDepartment of Chemistry, University College LondonDepartment of Chemistry, University College LondonDepartment of Chemistry, University College LondonAbstract The development of microelectronics prompts a search for precursors that can deposit conductive features. There is scarce research on Al as it is normally deposited using pyrophoric AlH3 etherates/aminates. Ligands can impart increased stability while maintaining the ability to deposit target materials. Accordingly, we have engineered an aluminium complex that can undergo conversion to Al(0) at 100 °C. Our multi-step synthetic design features β-ketoiminate compounds, [Al(R-ketoiminate)2Cl] (R = Me, Et, i Pr, Ph and Mes, 1-5) as starting materials to obtain aluminium hydride complexes: the polymeric amidoalane Li[AlH2( i Pr-Hacnac)AlH3]n (6) and the imidoalane cluster [AlH2AlH2(N-Mes)3(AlH2 ּ Li(Et2O)2)2] (8). Decomposition of 8 into aluminium metal is observed when heated under vacuum at 100 °C and is confirmed by XRD, TEM, XPS. Deposition of a highly conductive film of Al is achieved from 8 after three weeks under nitrogen at room temperature. This represents a route to metallic aluminium involving non-pyrophoric precursors at low temperatures.https://doi.org/10.1038/s41467-025-60786-2 |
| spellingShingle | Erica N. Faria Samuel P. Douglas Shreya Mrig Leonardo Santoni Adam J. Clancy Daniel W. N. Wilson Caroline E. Knapp A non-pyrophoric precursor for the low temperature deposition of metallic aluminium Nature Communications |
| title | A non-pyrophoric precursor for the low temperature deposition of metallic aluminium |
| title_full | A non-pyrophoric precursor for the low temperature deposition of metallic aluminium |
| title_fullStr | A non-pyrophoric precursor for the low temperature deposition of metallic aluminium |
| title_full_unstemmed | A non-pyrophoric precursor for the low temperature deposition of metallic aluminium |
| title_short | A non-pyrophoric precursor for the low temperature deposition of metallic aluminium |
| title_sort | non pyrophoric precursor for the low temperature deposition of metallic aluminium |
| url | https://doi.org/10.1038/s41467-025-60786-2 |
| work_keys_str_mv | AT ericanfaria anonpyrophoricprecursorforthelowtemperaturedepositionofmetallicaluminium AT samuelpdouglas anonpyrophoricprecursorforthelowtemperaturedepositionofmetallicaluminium AT shreyamrig anonpyrophoricprecursorforthelowtemperaturedepositionofmetallicaluminium AT leonardosantoni anonpyrophoricprecursorforthelowtemperaturedepositionofmetallicaluminium AT adamjclancy anonpyrophoricprecursorforthelowtemperaturedepositionofmetallicaluminium AT danielwnwilson anonpyrophoricprecursorforthelowtemperaturedepositionofmetallicaluminium AT carolineeknapp anonpyrophoricprecursorforthelowtemperaturedepositionofmetallicaluminium AT ericanfaria nonpyrophoricprecursorforthelowtemperaturedepositionofmetallicaluminium AT samuelpdouglas nonpyrophoricprecursorforthelowtemperaturedepositionofmetallicaluminium AT shreyamrig nonpyrophoricprecursorforthelowtemperaturedepositionofmetallicaluminium AT leonardosantoni nonpyrophoricprecursorforthelowtemperaturedepositionofmetallicaluminium AT adamjclancy nonpyrophoricprecursorforthelowtemperaturedepositionofmetallicaluminium AT danielwnwilson nonpyrophoricprecursorforthelowtemperaturedepositionofmetallicaluminium AT carolineeknapp nonpyrophoricprecursorforthelowtemperaturedepositionofmetallicaluminium |