Single-Ion Implantation for the Development of Si-Based MOSFET Devices with Quantum Functionalities
Interest in single-ion implantation is driven in part by research into development of solid-state devices that exhibit quantum behaviour in their electronic or optical characteristics. Here, we provide an overview of international research work on single ion implantation and single ion detection for...
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| Main Authors: | Jeffrey C. McCallum, David N. Jamieson, Changyi Yang, Andrew D. Alves, Brett C. Johnson, Toby Hopf, Samuel C. Thompson, Jessica A. van Donkelaar |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Wiley
2012-01-01
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| Series: | Advances in Materials Science and Engineering |
| Online Access: | http://dx.doi.org/10.1155/2012/272694 |
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