APA (7th ed.) Citation

Clochard, L., Young, D., Yu, M., & Bonilla, R. S. Patterning by Selective Etching of Poly-Silicon Using a High Etch Rate Single Sided Gaseous Process. TIB Open Publishing.

Chicago Style (17th ed.) Citation

Clochard, Laurent, David Young, Mingzhe Yu, and Ruy Sebastian Bonilla. Patterning by Selective Etching of Poly-Silicon Using a High Etch Rate Single Sided Gaseous Process. TIB Open Publishing.

MLA (9th ed.) Citation

Clochard, Laurent, et al. Patterning by Selective Etching of Poly-Silicon Using a High Etch Rate Single Sided Gaseous Process. TIB Open Publishing.