Revisiting the role of oxidation in stable and high-performance lead-free perovskite-IGZO junction field-effect transistors

Abstract Mitigating the oxidation susceptibility of Sn remains a critical issue for improving the environmental stability of lead-free perovskites. Herein, we show that the oxidized surface layer of Sn-based perovskites can be utilized to improve transistor performance, rather than being entirely su...

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Main Authors: Seonkwon Kim, Su Hyun Kim, Hui Ung Hwang, Jeongmin Kim, Jeong Won Kim, In Cheol Kwak, Byeongjae Kang, Seungjae Lee, Sae Byeok Jo, Du Yeol Ryu, Hyunjung Kim, Jae-Min Myoung, Moon Sung Kang, Saeroonter Oh, Jeong Ho Cho
Format: Article
Language:English
Published: Nature Portfolio 2025-08-01
Series:Nature Communications
Online Access:https://doi.org/10.1038/s41467-025-62770-2
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author Seonkwon Kim
Su Hyun Kim
Hui Ung Hwang
Jeongmin Kim
Jeong Won Kim
In Cheol Kwak
Byeongjae Kang
Seungjae Lee
Sae Byeok Jo
Du Yeol Ryu
Hyunjung Kim
Jae-Min Myoung
Moon Sung Kang
Saeroonter Oh
Jeong Ho Cho
author_facet Seonkwon Kim
Su Hyun Kim
Hui Ung Hwang
Jeongmin Kim
Jeong Won Kim
In Cheol Kwak
Byeongjae Kang
Seungjae Lee
Sae Byeok Jo
Du Yeol Ryu
Hyunjung Kim
Jae-Min Myoung
Moon Sung Kang
Saeroonter Oh
Jeong Ho Cho
author_sort Seonkwon Kim
collection DOAJ
description Abstract Mitigating the oxidation susceptibility of Sn remains a critical issue for improving the environmental stability of lead-free perovskites. Herein, we show that the oxidized surface layer of Sn-based perovskites can be utilized to improve transistor performance, rather than being entirely suppressed. We report perovskite-IGZO junction field-effect transistors that use this oxidized layer to suppress gate current to below 10−10 A, enabling enhancement-mode operation. We refer to these as barriered junction field-effect transistors. The combination of the gate leakage suppression and high polarizability of the perovskite layer results in a field-effect mobility of 29.4 cm2V−1s−1, subthreshold swing of 67.1 mV dec−1, and on/off current ratio exceeding 105 under ≤1 V operation. These devices maintain stable operation in ambient conditions. Furthermore, we demonstrate their applicability by constructing logic gates such as NOT, NOR and NAND. These findings highlight the potential of exploiting Sn-based perovskite oxidation to advance electronic devices.
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spelling doaj-art-762a8de6c46f427fb15a59e93bf4f95f2025-08-20T04:03:07ZengNature PortfolioNature Communications2041-17232025-08-0116111010.1038/s41467-025-62770-2Revisiting the role of oxidation in stable and high-performance lead-free perovskite-IGZO junction field-effect transistorsSeonkwon Kim0Su Hyun Kim1Hui Ung Hwang2Jeongmin Kim3Jeong Won Kim4In Cheol Kwak5Byeongjae Kang6Seungjae Lee7Sae Byeok Jo8Du Yeol Ryu9Hyunjung Kim10Jae-Min Myoung11Moon Sung Kang12Saeroonter Oh13Jeong Ho Cho14Department of Chemical and Biomolecular Engineering, Yonsei UniversityDepartment of Electrical and Computer Engineering, Sungkyunkwan UniversityKorea Research Institute of Standards and Science (KRISS)Division of Nanotechnology, DGISTKorea Research Institute of Standards and Science (KRISS)Department of Chemical and Biomolecular Engineering, Yonsei UniversityDepartment of Physics, Center for Ultrafast Phase Transformation, Sogang UniversityDepartment of Chemical and Biomolecular Engineering, Yonsei UniversitySchool of Chemical Engineering, Sungkyunkwan University (SKKU)Department of Chemical and Biomolecular Engineering, Yonsei UniversityDepartment of Physics, Center for Ultrafast Phase Transformation, Sogang UniversityDepartment of Materials Science and Engineering, Yonsei UniversityDepartment of Chemical and Biomolecular Engineering, Sogang UniversityDepartment of Semiconductor Convergence Engineering, Sungkyunkwan UniversityDepartment of Chemical and Biomolecular Engineering, Yonsei UniversityAbstract Mitigating the oxidation susceptibility of Sn remains a critical issue for improving the environmental stability of lead-free perovskites. Herein, we show that the oxidized surface layer of Sn-based perovskites can be utilized to improve transistor performance, rather than being entirely suppressed. We report perovskite-IGZO junction field-effect transistors that use this oxidized layer to suppress gate current to below 10−10 A, enabling enhancement-mode operation. We refer to these as barriered junction field-effect transistors. The combination of the gate leakage suppression and high polarizability of the perovskite layer results in a field-effect mobility of 29.4 cm2V−1s−1, subthreshold swing of 67.1 mV dec−1, and on/off current ratio exceeding 105 under ≤1 V operation. These devices maintain stable operation in ambient conditions. Furthermore, we demonstrate their applicability by constructing logic gates such as NOT, NOR and NAND. These findings highlight the potential of exploiting Sn-based perovskite oxidation to advance electronic devices.https://doi.org/10.1038/s41467-025-62770-2
spellingShingle Seonkwon Kim
Su Hyun Kim
Hui Ung Hwang
Jeongmin Kim
Jeong Won Kim
In Cheol Kwak
Byeongjae Kang
Seungjae Lee
Sae Byeok Jo
Du Yeol Ryu
Hyunjung Kim
Jae-Min Myoung
Moon Sung Kang
Saeroonter Oh
Jeong Ho Cho
Revisiting the role of oxidation in stable and high-performance lead-free perovskite-IGZO junction field-effect transistors
Nature Communications
title Revisiting the role of oxidation in stable and high-performance lead-free perovskite-IGZO junction field-effect transistors
title_full Revisiting the role of oxidation in stable and high-performance lead-free perovskite-IGZO junction field-effect transistors
title_fullStr Revisiting the role of oxidation in stable and high-performance lead-free perovskite-IGZO junction field-effect transistors
title_full_unstemmed Revisiting the role of oxidation in stable and high-performance lead-free perovskite-IGZO junction field-effect transistors
title_short Revisiting the role of oxidation in stable and high-performance lead-free perovskite-IGZO junction field-effect transistors
title_sort revisiting the role of oxidation in stable and high performance lead free perovskite igzo junction field effect transistors
url https://doi.org/10.1038/s41467-025-62770-2
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