Energy yield framework to simulate thin film CIGS solar cells and analyze limitations of the technology

Abstract This study presents a comprehensive evaluation of Copper Indium Gallium Selenide (CIGS) solar technology, benchmarked against crystalline silicon (c-Si) PERC PV technology. Utilizing a newly developed energy yield model, we analyzed the performance of CIGS in various environmental scenarios...

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Bibliographic Details
Main Authors: Santhosh Ramesh, Arttu Tuomiranta, Georgi H. Yordanov, Hussein Badran, Ali Hajjiah, Bart Vermang, Jef Poortmans
Format: Article
Language:English
Published: Nature Portfolio 2025-01-01
Series:Scientific Reports
Online Access:https://doi.org/10.1038/s41598-024-78862-w
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Summary:Abstract This study presents a comprehensive evaluation of Copper Indium Gallium Selenide (CIGS) solar technology, benchmarked against crystalline silicon (c-Si) PERC PV technology. Utilizing a newly developed energy yield model, we analyzed the performance of CIGS in various environmental scenarios, emphasizing its behavior in low-light conditions and under different temperature regimes. The model demonstrated high accuracy with improved error metrics of normalized mean bias error (nMBE) ~ 1% and normalized root mean square error (nRMSE) of  ~ 8%–20% in simulating rack mounted setup and integrated PV systems. Key findings reveal that the CIGS technology, while slightly underperforming in integrated, low-irradiance setups, shows comparable or superior performance to c-Si PERC technology in high-irradiance and high-temperature conditions. A significant focus of the study was on the low-light performance of CIGS, where it exhibited notable voltage losses. Our research highlights the importance of reducing the diode ideality factor for enhancing CIGS power conversion efficiency, particularly In low-light conditions. These insights provide a pathway for future research and technological improvements, emphasizing defect engineering, passivation strategies to advance the understanding and application of the CIGS technology.
ISSN:2045-2322