Rational Doping Strategy to Build the First Solution‐Processed p‐n Homojunction Architecture toward Silicon Quantum Dot Photodetectors

Semiconductor p‐n homojunction is a requisite building block of operating transistors and diodes which make up the modern electronic circuits and optoelectronic applications. However, it has been so far limited to bulk form of single crystals such as silicon (Si) or gallium arsenide. Herein, a brand...

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Main Authors: Batu Ghosh, Hiroyuki Yamada, Kazuhiro Nemoto, Wipakorn Jevasuwan, Naoki Fukata, Hon‐Tao Sun, Naoto Shirahata
Format: Article
Language:English
Published: Wiley-VCH 2024-12-01
Series:Small Science
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Online Access:https://doi.org/10.1002/smsc.202400367
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author Batu Ghosh
Hiroyuki Yamada
Kazuhiro Nemoto
Wipakorn Jevasuwan
Naoki Fukata
Hon‐Tao Sun
Naoto Shirahata
author_facet Batu Ghosh
Hiroyuki Yamada
Kazuhiro Nemoto
Wipakorn Jevasuwan
Naoki Fukata
Hon‐Tao Sun
Naoto Shirahata
author_sort Batu Ghosh
collection DOAJ
description Semiconductor p‐n homojunction is a requisite building block of operating transistors and diodes which make up the modern electronic circuits and optoelectronic applications. However, it has been so far limited to bulk form of single crystals such as silicon (Si) or gallium arsenide. Herein, a brand‐new method of constructing p‐n homojunction architectures that breaks through the limitation is presented. Colloidal inks of p‐type and n‐type Si quantum dots (QDs) are synthesized by thermal disproportionation of (HSiO1.5)n doped with boron or phosphorus, followed by surface ligand engineering. Analysis combining UV photoelectron spectroscopy, electron spin resonance, and current–voltage characteristics confirms that an orthogonal solvent trick makes clean interfaces between n‐type and p‐type SiQD layers without disruption on film formation. The forward and reverse current–voltage characteristics of the diode, along with various spectroscopic characterizations, demonstrate the formation of the first p‐n homojunction of SiQDs. The self‐powered photodiode provides a tunable response specific to the wavelength.
format Article
id doaj-art-6614446d7a4c4d02a8c14a038d24f58d
institution Kabale University
issn 2688-4046
language English
publishDate 2024-12-01
publisher Wiley-VCH
record_format Article
series Small Science
spelling doaj-art-6614446d7a4c4d02a8c14a038d24f58d2024-12-01T13:34:05ZengWiley-VCHSmall Science2688-40462024-12-01412n/an/a10.1002/smsc.202400367Rational Doping Strategy to Build the First Solution‐Processed p‐n Homojunction Architecture toward Silicon Quantum Dot PhotodetectorsBatu Ghosh0Hiroyuki Yamada1Kazuhiro Nemoto2Wipakorn Jevasuwan3Naoki Fukata4Hon‐Tao Sun5Naoto Shirahata6Research Center for Materials Nanoarchitectonics (MANA) National Institute for Materials Science (NIMS) 1‐1 Namiki Tsukuba 305‐0044 JapanResearch Center for Materials Nanoarchitectonics (MANA) National Institute for Materials Science (NIMS) 1‐1 Namiki Tsukuba 305‐0044 JapanResearch Center for Materials Nanoarchitectonics (MANA) National Institute for Materials Science (NIMS) 1‐1 Namiki Tsukuba 305‐0044 JapanResearch Center for Materials Nanoarchitectonics (MANA) National Institute for Materials Science (NIMS) 1‐1 Namiki Tsukuba 305‐0044 JapanResearch Center for Materials Nanoarchitectonics (MANA) National Institute for Materials Science (NIMS) 1‐1 Namiki Tsukuba 305‐0044 JapanResearch Center for Materials Nanoarchitectonics (MANA) National Institute for Materials Science (NIMS) 1‐1 Namiki Tsukuba 305‐0044 JapanResearch Center for Materials Nanoarchitectonics (MANA) National Institute for Materials Science (NIMS) 1‐1 Namiki Tsukuba 305‐0044 JapanSemiconductor p‐n homojunction is a requisite building block of operating transistors and diodes which make up the modern electronic circuits and optoelectronic applications. However, it has been so far limited to bulk form of single crystals such as silicon (Si) or gallium arsenide. Herein, a brand‐new method of constructing p‐n homojunction architectures that breaks through the limitation is presented. Colloidal inks of p‐type and n‐type Si quantum dots (QDs) are synthesized by thermal disproportionation of (HSiO1.5)n doped with boron or phosphorus, followed by surface ligand engineering. Analysis combining UV photoelectron spectroscopy, electron spin resonance, and current–voltage characteristics confirms that an orthogonal solvent trick makes clean interfaces between n‐type and p‐type SiQD layers without disruption on film formation. The forward and reverse current–voltage characteristics of the diode, along with various spectroscopic characterizations, demonstrate the formation of the first p‐n homojunction of SiQDs. The self‐powered photodiode provides a tunable response specific to the wavelength.https://doi.org/10.1002/smsc.202400367electric impurity dopingp‐n homojunctionphotodiodessilicon quantum dotssolution‐processed optoelectronics
spellingShingle Batu Ghosh
Hiroyuki Yamada
Kazuhiro Nemoto
Wipakorn Jevasuwan
Naoki Fukata
Hon‐Tao Sun
Naoto Shirahata
Rational Doping Strategy to Build the First Solution‐Processed p‐n Homojunction Architecture toward Silicon Quantum Dot Photodetectors
Small Science
electric impurity doping
p‐n homojunction
photodiodes
silicon quantum dots
solution‐processed optoelectronics
title Rational Doping Strategy to Build the First Solution‐Processed p‐n Homojunction Architecture toward Silicon Quantum Dot Photodetectors
title_full Rational Doping Strategy to Build the First Solution‐Processed p‐n Homojunction Architecture toward Silicon Quantum Dot Photodetectors
title_fullStr Rational Doping Strategy to Build the First Solution‐Processed p‐n Homojunction Architecture toward Silicon Quantum Dot Photodetectors
title_full_unstemmed Rational Doping Strategy to Build the First Solution‐Processed p‐n Homojunction Architecture toward Silicon Quantum Dot Photodetectors
title_short Rational Doping Strategy to Build the First Solution‐Processed p‐n Homojunction Architecture toward Silicon Quantum Dot Photodetectors
title_sort rational doping strategy to build the first solution processed p n homojunction architecture toward silicon quantum dot photodetectors
topic electric impurity doping
p‐n homojunction
photodiodes
silicon quantum dots
solution‐processed optoelectronics
url https://doi.org/10.1002/smsc.202400367
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