Remote epitaxy and exfoliation of vanadium dioxide via sub-nanometer thick amorphous interlayer
Abstract The recently emerged remote epitaxy technique, utilizing 2D materials (mostly graphene) as interlayers between the epilayer and the substrate, enables the exfoliation of crystalline nanomembranes from the substrate, expanding the range of potential device applications. However, remote epita...
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| Format: | Article |
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Nature Portfolio
2025-01-01
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| Series: | Nature Communications |
| Online Access: | https://doi.org/10.1038/s41467-024-55402-8 |
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| author | Chang Liu Xing Li Yang Wang Zhi Zheng Binmin Wu Wenhao He Xiang Dong Ziyu Zhang Bingxin Chen Jiayuan Huang Zhenghua An Changlin Zheng Gaoshan Huang Yongfeng Mei |
| author_facet | Chang Liu Xing Li Yang Wang Zhi Zheng Binmin Wu Wenhao He Xiang Dong Ziyu Zhang Bingxin Chen Jiayuan Huang Zhenghua An Changlin Zheng Gaoshan Huang Yongfeng Mei |
| author_sort | Chang Liu |
| collection | DOAJ |
| description | Abstract The recently emerged remote epitaxy technique, utilizing 2D materials (mostly graphene) as interlayers between the epilayer and the substrate, enables the exfoliation of crystalline nanomembranes from the substrate, expanding the range of potential device applications. However, remote epitaxy has been so far applied to a limited range of material systems, owing to the need of stringent growth conditions to avoid graphene damaging, and has therefore remained challenging for the synthesis of oxide nanomembranes. Here, we demonstrate the remote epitaxial growth of an oxide nanomembrane (vanadium dioxide, VO2) with a sub-nanometer thick amorphous interlayer, which can withstand potential sputtering-induced damage and oxidation. By removing the amorphous interlayer, a 4-inch wafer-scale freestanding VO2 nanomembrane can be obtained, exhibiting intact crystalline structure and physical properties. In addition, multi-shaped freestanding infrared bolometers are fabricated based on the epitaxial VO2 nanomembranes, showing high detectivity and low current noise. Our strategy provides a promising way to explore various freestanding heteroepitaxial oxide materials for future large-scale integrated circuits and functional devices. |
| format | Article |
| id | doaj-art-65dac7d2ab6b432483bdba2d8d5413fd |
| institution | Kabale University |
| issn | 2041-1723 |
| language | English |
| publishDate | 2025-01-01 |
| publisher | Nature Portfolio |
| record_format | Article |
| series | Nature Communications |
| spelling | doaj-art-65dac7d2ab6b432483bdba2d8d5413fd2025-01-05T12:40:23ZengNature PortfolioNature Communications2041-17232025-01-011611910.1038/s41467-024-55402-8Remote epitaxy and exfoliation of vanadium dioxide via sub-nanometer thick amorphous interlayerChang Liu0Xing Li1Yang Wang2Zhi Zheng3Binmin Wu4Wenhao He5Xiang Dong6Ziyu Zhang7Bingxin Chen8Jiayuan Huang9Zhenghua An10Changlin Zheng11Gaoshan Huang12Yongfeng Mei13Department of Materials Science & International Institute of Intelligent Nanorobots and Nanosystems, State Key Laboratory of Surface Physics, Fudan UniversityDepartment of Materials Science & International Institute of Intelligent Nanorobots and Nanosystems, State Key Laboratory of Surface Physics, Fudan UniversityDepartment of Materials Science & International Institute of Intelligent Nanorobots and Nanosystems, State Key Laboratory of Surface Physics, Fudan UniversityDepartment of Materials Science & International Institute of Intelligent Nanorobots and Nanosystems, State Key Laboratory of Surface Physics, Fudan UniversityState Key Laboratory of Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of SciencesState Key Laboratory of Surface Physics and Department of Physics, Fudan UniversityDepartment of Materials Science & International Institute of Intelligent Nanorobots and Nanosystems, State Key Laboratory of Surface Physics, Fudan UniversityDepartment of Materials Science & International Institute of Intelligent Nanorobots and Nanosystems, State Key Laboratory of Surface Physics, Fudan UniversityState Key Laboratory of Surface Physics & Institute for Nanoelectronic Devices and Quantum Computing, Department of Physics, Fudan UniversityDepartment of Materials Science & International Institute of Intelligent Nanorobots and Nanosystems, State Key Laboratory of Surface Physics, Fudan UniversityState Key Laboratory of Surface Physics & Institute for Nanoelectronic Devices and Quantum Computing, Department of Physics, Fudan UniversityState Key Laboratory of Surface Physics and Department of Physics, Fudan UniversityDepartment of Materials Science & International Institute of Intelligent Nanorobots and Nanosystems, State Key Laboratory of Surface Physics, Fudan UniversityDepartment of Materials Science & International Institute of Intelligent Nanorobots and Nanosystems, State Key Laboratory of Surface Physics, Fudan UniversityAbstract The recently emerged remote epitaxy technique, utilizing 2D materials (mostly graphene) as interlayers between the epilayer and the substrate, enables the exfoliation of crystalline nanomembranes from the substrate, expanding the range of potential device applications. However, remote epitaxy has been so far applied to a limited range of material systems, owing to the need of stringent growth conditions to avoid graphene damaging, and has therefore remained challenging for the synthesis of oxide nanomembranes. Here, we demonstrate the remote epitaxial growth of an oxide nanomembrane (vanadium dioxide, VO2) with a sub-nanometer thick amorphous interlayer, which can withstand potential sputtering-induced damage and oxidation. By removing the amorphous interlayer, a 4-inch wafer-scale freestanding VO2 nanomembrane can be obtained, exhibiting intact crystalline structure and physical properties. In addition, multi-shaped freestanding infrared bolometers are fabricated based on the epitaxial VO2 nanomembranes, showing high detectivity and low current noise. Our strategy provides a promising way to explore various freestanding heteroepitaxial oxide materials for future large-scale integrated circuits and functional devices.https://doi.org/10.1038/s41467-024-55402-8 |
| spellingShingle | Chang Liu Xing Li Yang Wang Zhi Zheng Binmin Wu Wenhao He Xiang Dong Ziyu Zhang Bingxin Chen Jiayuan Huang Zhenghua An Changlin Zheng Gaoshan Huang Yongfeng Mei Remote epitaxy and exfoliation of vanadium dioxide via sub-nanometer thick amorphous interlayer Nature Communications |
| title | Remote epitaxy and exfoliation of vanadium dioxide via sub-nanometer thick amorphous interlayer |
| title_full | Remote epitaxy and exfoliation of vanadium dioxide via sub-nanometer thick amorphous interlayer |
| title_fullStr | Remote epitaxy and exfoliation of vanadium dioxide via sub-nanometer thick amorphous interlayer |
| title_full_unstemmed | Remote epitaxy and exfoliation of vanadium dioxide via sub-nanometer thick amorphous interlayer |
| title_short | Remote epitaxy and exfoliation of vanadium dioxide via sub-nanometer thick amorphous interlayer |
| title_sort | remote epitaxy and exfoliation of vanadium dioxide via sub nanometer thick amorphous interlayer |
| url | https://doi.org/10.1038/s41467-024-55402-8 |
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