Preparation of Metal-Containing Diamond-Like Carbon Films by Magnetron Sputtering and Plasma Source Ion Implantation and Their Properties
Metal-containing diamond-like carbon (Me-DLC) films were prepared by a combination of plasma source ion implantation (PSII) and reactive magnetron sputtering. Two metals were used that differ in their tendency to form carbide and possess a different sputter yield, that is, Cu with a relatively high...
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| Format: | Article |
| Language: | English |
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Wiley
2017-01-01
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| Series: | Advances in Materials Science and Engineering |
| Online Access: | http://dx.doi.org/10.1155/2017/9082164 |
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| author | Stefan Flege Ruriko Hatada Andreas Hanauer Wolfgang Ensinger Takao Morimura Koumei Baba |
| author_facet | Stefan Flege Ruriko Hatada Andreas Hanauer Wolfgang Ensinger Takao Morimura Koumei Baba |
| author_sort | Stefan Flege |
| collection | DOAJ |
| description | Metal-containing diamond-like carbon (Me-DLC) films were prepared by a combination of plasma source ion implantation (PSII) and reactive magnetron sputtering. Two metals were used that differ in their tendency to form carbide and possess a different sputter yield, that is, Cu with a relatively high sputter yield and Ti with a comparatively low one. The DLC film preparation was based on the hydrocarbon gas ethylene (C2H4). The preparation technique is described and the parameters influencing the metal content within the film are discussed. Film properties that are changed by the metal addition, such as structure, electrical resistivity, and friction coefficient, were evaluated and compared with those of pure DLC films as well as with literature values for Me-DLC films prepared with a different hydrocarbon gas or containing other metals. |
| format | Article |
| id | doaj-art-610052422a234c20a64420a64ebbdd7a |
| institution | Kabale University |
| issn | 1687-8434 1687-8442 |
| language | English |
| publishDate | 2017-01-01 |
| publisher | Wiley |
| record_format | Article |
| series | Advances in Materials Science and Engineering |
| spelling | doaj-art-610052422a234c20a64420a64ebbdd7a2025-02-03T05:47:44ZengWileyAdvances in Materials Science and Engineering1687-84341687-84422017-01-01201710.1155/2017/90821649082164Preparation of Metal-Containing Diamond-Like Carbon Films by Magnetron Sputtering and Plasma Source Ion Implantation and Their PropertiesStefan Flege0Ruriko Hatada1Andreas Hanauer2Wolfgang Ensinger3Takao Morimura4Koumei Baba5Department of Materials Science, Technische Universität Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, GermanyDepartment of Materials Science, Technische Universität Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, GermanyDepartment of Materials Science, Technische Universität Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, GermanyDepartment of Materials Science, Technische Universität Darmstadt, Alarich-Weiss-Str. 2, 64287 Darmstadt, GermanyNagasaki University, Graduate School of Engineering, 1-14 Bunkyo, Nagasaki 852-8521, JapanNagasaki University, Graduate School of Engineering, 1-14 Bunkyo, Nagasaki 852-8521, JapanMetal-containing diamond-like carbon (Me-DLC) films were prepared by a combination of plasma source ion implantation (PSII) and reactive magnetron sputtering. Two metals were used that differ in their tendency to form carbide and possess a different sputter yield, that is, Cu with a relatively high sputter yield and Ti with a comparatively low one. The DLC film preparation was based on the hydrocarbon gas ethylene (C2H4). The preparation technique is described and the parameters influencing the metal content within the film are discussed. Film properties that are changed by the metal addition, such as structure, electrical resistivity, and friction coefficient, were evaluated and compared with those of pure DLC films as well as with literature values for Me-DLC films prepared with a different hydrocarbon gas or containing other metals.http://dx.doi.org/10.1155/2017/9082164 |
| spellingShingle | Stefan Flege Ruriko Hatada Andreas Hanauer Wolfgang Ensinger Takao Morimura Koumei Baba Preparation of Metal-Containing Diamond-Like Carbon Films by Magnetron Sputtering and Plasma Source Ion Implantation and Their Properties Advances in Materials Science and Engineering |
| title | Preparation of Metal-Containing Diamond-Like Carbon Films by Magnetron Sputtering and Plasma Source Ion Implantation and Their Properties |
| title_full | Preparation of Metal-Containing Diamond-Like Carbon Films by Magnetron Sputtering and Plasma Source Ion Implantation and Their Properties |
| title_fullStr | Preparation of Metal-Containing Diamond-Like Carbon Films by Magnetron Sputtering and Plasma Source Ion Implantation and Their Properties |
| title_full_unstemmed | Preparation of Metal-Containing Diamond-Like Carbon Films by Magnetron Sputtering and Plasma Source Ion Implantation and Their Properties |
| title_short | Preparation of Metal-Containing Diamond-Like Carbon Films by Magnetron Sputtering and Plasma Source Ion Implantation and Their Properties |
| title_sort | preparation of metal containing diamond like carbon films by magnetron sputtering and plasma source ion implantation and their properties |
| url | http://dx.doi.org/10.1155/2017/9082164 |
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