Thin films as practical quantum materials: A status quo and beyond
Quantum materials have been in the limelight for several years now. These materials exhibit intriguing quantum phenomena, which, when harnessed properly, promise extraordinary advancements across various scientific and technological domains. To fully exploit their potential, it is imperative to synt...
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| Format: | Article |
| Language: | English |
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AIP Publishing LLC
2024-12-01
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| Series: | APL Materials |
| Online Access: | http://dx.doi.org/10.1063/5.0235472 |
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| _version_ | 1846093508080828416 |
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| author | Chaehyeong Ha Yoon Jang Chung |
| author_facet | Chaehyeong Ha Yoon Jang Chung |
| author_sort | Chaehyeong Ha |
| collection | DOAJ |
| description | Quantum materials have been in the limelight for several years now. These materials exhibit intriguing quantum phenomena, which, when harnessed properly, promise extraordinary advancements across various scientific and technological domains. To fully exploit their potential, it is imperative to synthesize such quantum materials in thin film form so that they are compatible with well-established device fabrication techniques. In this perspective, an overview of the current status and future directions of thin film quantum material synthesis is provided. The criteria for quantum materials are discussed, as well as the many benefits of preparing them as thin films. Prominent deposition techniques such as molecular beam epitaxy and chemical vapor deposition are reviewed along with potential contenders. Despite challenges, progress in thin film quantum material technology holds the potential to realize practical devices with unprecedented functionalities. |
| format | Article |
| id | doaj-art-60584d1fd9c54d72a4a27ca4dd5044ca |
| institution | Kabale University |
| issn | 2166-532X |
| language | English |
| publishDate | 2024-12-01 |
| publisher | AIP Publishing LLC |
| record_format | Article |
| series | APL Materials |
| spelling | doaj-art-60584d1fd9c54d72a4a27ca4dd5044ca2025-01-02T17:16:13ZengAIP Publishing LLCAPL Materials2166-532X2024-12-011212120901120901-1010.1063/5.0235472Thin films as practical quantum materials: A status quo and beyondChaehyeong Ha0Yoon Jang Chung1Department of Chemical and Biological Engineering, Korea University, Seoul 02841, Republic of KoreaDepartment of Chemical and Biological Engineering, Korea University, Seoul 02841, Republic of KoreaQuantum materials have been in the limelight for several years now. These materials exhibit intriguing quantum phenomena, which, when harnessed properly, promise extraordinary advancements across various scientific and technological domains. To fully exploit their potential, it is imperative to synthesize such quantum materials in thin film form so that they are compatible with well-established device fabrication techniques. In this perspective, an overview of the current status and future directions of thin film quantum material synthesis is provided. The criteria for quantum materials are discussed, as well as the many benefits of preparing them as thin films. Prominent deposition techniques such as molecular beam epitaxy and chemical vapor deposition are reviewed along with potential contenders. Despite challenges, progress in thin film quantum material technology holds the potential to realize practical devices with unprecedented functionalities.http://dx.doi.org/10.1063/5.0235472 |
| spellingShingle | Chaehyeong Ha Yoon Jang Chung Thin films as practical quantum materials: A status quo and beyond APL Materials |
| title | Thin films as practical quantum materials: A status quo and beyond |
| title_full | Thin films as practical quantum materials: A status quo and beyond |
| title_fullStr | Thin films as practical quantum materials: A status quo and beyond |
| title_full_unstemmed | Thin films as practical quantum materials: A status quo and beyond |
| title_short | Thin films as practical quantum materials: A status quo and beyond |
| title_sort | thin films as practical quantum materials a status quo and beyond |
| url | http://dx.doi.org/10.1063/5.0235472 |
| work_keys_str_mv | AT chaehyeongha thinfilmsaspracticalquantummaterialsastatusquoandbeyond AT yoonjangchung thinfilmsaspracticalquantummaterialsastatusquoandbeyond |