Discovering deposition process regimes: Leveraging unsupervised learning for process insights, surrogate modeling, and sensitivity analysis

This work introduces a comprehensive approach utilizing data-driven methods to elucidate the deposition process regimes in Chemical Vapor Deposition (CVD) reactors and the interplay of physical mechanism that dominate in each one of them. Through this work, we address three key objectives. Firstly,...

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Main Authors: Geremy Loachamín-Suntaxi, Paris Papavasileiou, Eleni D. Koronaki, Dimitrios G. Giovanis, Georgios Gakis, Ioannis G. Aviziotis, Martin Kathrein, Gabriele Pozzetti, Christoph Czettl, Stéphane P.A. Bordas, Andreas G. Boudouvis
Format: Article
Language:English
Published: Elsevier 2024-11-01
Series:Chemical Engineering Journal Advances
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Online Access:http://www.sciencedirect.com/science/article/pii/S266682112400084X
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author Geremy Loachamín-Suntaxi
Paris Papavasileiou
Eleni D. Koronaki
Dimitrios G. Giovanis
Georgios Gakis
Ioannis G. Aviziotis
Martin Kathrein
Gabriele Pozzetti
Christoph Czettl
Stéphane P.A. Bordas
Andreas G. Boudouvis
author_facet Geremy Loachamín-Suntaxi
Paris Papavasileiou
Eleni D. Koronaki
Dimitrios G. Giovanis
Georgios Gakis
Ioannis G. Aviziotis
Martin Kathrein
Gabriele Pozzetti
Christoph Czettl
Stéphane P.A. Bordas
Andreas G. Boudouvis
author_sort Geremy Loachamín-Suntaxi
collection DOAJ
description This work introduces a comprehensive approach utilizing data-driven methods to elucidate the deposition process regimes in Chemical Vapor Deposition (CVD) reactors and the interplay of physical mechanism that dominate in each one of them. Through this work, we address three key objectives. Firstly, our methodology relies on process outcomes, derived by a detailed CFD model, to identify clusters of “outcomes” corresponding to distinct process regimes, wherein the relative influence of input variables undergoes notable shifts. This phenomenon is experimentally validated through Arrhenius plot analysis, affirming the efficacy of our approach. Secondly, we demonstrate the development of an efficient surrogate model, based on Polynomial Chaos Expansion (PCE), that maintains accuracy, facilitating streamlined computational analyses. Finally, as a result of PCE, sensitivity analysis is made possible by means of Sobol’ indices, that quantify the impact of process inputs across identified regimes.The insights gained from our analysis contribute to the formulation of hypotheses regarding phenomena occurring beyond the transition regime. Notably, the significance of temperature even in the diffusion-limited regime, as evidenced by the Arrhenius plot, suggests activation of gas phase reactions at elevated temperatures. Importantly, our proposed methods yield insights that align with experimental observations and theoretical principles, aiding decision-making in process design and optimization. By circumventing the need for costly and time-consuming experiments, our approach offers a pragmatic pathway toward enhanced process efficiency. Moreover, this study underscores the potential of data-driven computational methods for innovating reactor design paradigms.
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spelling doaj-art-4e9abd65e7e242f6ba248349f64fd7b02024-12-04T05:14:40ZengElsevierChemical Engineering Journal Advances2666-82112024-11-0120100667Discovering deposition process regimes: Leveraging unsupervised learning for process insights, surrogate modeling, and sensitivity analysisGeremy Loachamín-Suntaxi0Paris Papavasileiou1Eleni D. Koronaki2Dimitrios G. Giovanis3Georgios Gakis4Ioannis G. Aviziotis5Martin Kathrein6Gabriele Pozzetti7Christoph Czettl8Stéphane P.A. Bordas9Andreas G. Boudouvis10Faculty of Science, Technology and Medicine, University of Luxembourg, Esch-sur-Alzette, L-4364, Luxembourg; School of Chemical Engineering, National Technical University of Athens, Zographos Campus, 15780, Attiki, GreeceFaculty of Science, Technology and Medicine, University of Luxembourg, Esch-sur-Alzette, L-4364, Luxembourg; School of Chemical Engineering, National Technical University of Athens, Zographos Campus, 15780, Attiki, GreeceFaculty of Science, Technology and Medicine, University of Luxembourg, Esch-sur-Alzette, L-4364, LuxembourgDepartment of Civil & Systems Engineering, Johns Hopkins University, Baltimore, MD 21218, USASchool of Chemical Engineering, National Technical University of Athens, Zographos Campus, 15780, Attiki, GreeceSchool of Chemical Engineering, National Technical University of Athens, Zographos Campus, 15780, Attiki, GreeceCERATIZIT Luxembourg S.à r.l. Mamer, L-8201, LuxembourgCERATIZIT Luxembourg S.à r.l. Mamer, L-8201, LuxembourgCERATIZIT Austria GmbH Reutte, A-6600, AustriaFaculty of Science, Technology and Medicine, University of Luxembourg, Esch-sur-Alzette, L-4364, Luxembourg; Correspondence to: School of Chemical Engineering, National Technical University of Athens, Zographos Campus, 15780, Attiki, Greece.School of Chemical Engineering, National Technical University of Athens, Zographos Campus, 15780, Attiki, GreeceThis work introduces a comprehensive approach utilizing data-driven methods to elucidate the deposition process regimes in Chemical Vapor Deposition (CVD) reactors and the interplay of physical mechanism that dominate in each one of them. Through this work, we address three key objectives. Firstly, our methodology relies on process outcomes, derived by a detailed CFD model, to identify clusters of “outcomes” corresponding to distinct process regimes, wherein the relative influence of input variables undergoes notable shifts. This phenomenon is experimentally validated through Arrhenius plot analysis, affirming the efficacy of our approach. Secondly, we demonstrate the development of an efficient surrogate model, based on Polynomial Chaos Expansion (PCE), that maintains accuracy, facilitating streamlined computational analyses. Finally, as a result of PCE, sensitivity analysis is made possible by means of Sobol’ indices, that quantify the impact of process inputs across identified regimes.The insights gained from our analysis contribute to the formulation of hypotheses regarding phenomena occurring beyond the transition regime. Notably, the significance of temperature even in the diffusion-limited regime, as evidenced by the Arrhenius plot, suggests activation of gas phase reactions at elevated temperatures. Importantly, our proposed methods yield insights that align with experimental observations and theoretical principles, aiding decision-making in process design and optimization. By circumventing the need for costly and time-consuming experiments, our approach offers a pragmatic pathway toward enhanced process efficiency. Moreover, this study underscores the potential of data-driven computational methods for innovating reactor design paradigms.http://www.sciencedirect.com/science/article/pii/S266682112400084XArrhenius plotFe CVD reactorHierarchical clusteringPolynomial chaos expansionUncertainty quantificationSensitivity analysis
spellingShingle Geremy Loachamín-Suntaxi
Paris Papavasileiou
Eleni D. Koronaki
Dimitrios G. Giovanis
Georgios Gakis
Ioannis G. Aviziotis
Martin Kathrein
Gabriele Pozzetti
Christoph Czettl
Stéphane P.A. Bordas
Andreas G. Boudouvis
Discovering deposition process regimes: Leveraging unsupervised learning for process insights, surrogate modeling, and sensitivity analysis
Chemical Engineering Journal Advances
Arrhenius plot
Fe CVD reactor
Hierarchical clustering
Polynomial chaos expansion
Uncertainty quantification
Sensitivity analysis
title Discovering deposition process regimes: Leveraging unsupervised learning for process insights, surrogate modeling, and sensitivity analysis
title_full Discovering deposition process regimes: Leveraging unsupervised learning for process insights, surrogate modeling, and sensitivity analysis
title_fullStr Discovering deposition process regimes: Leveraging unsupervised learning for process insights, surrogate modeling, and sensitivity analysis
title_full_unstemmed Discovering deposition process regimes: Leveraging unsupervised learning for process insights, surrogate modeling, and sensitivity analysis
title_short Discovering deposition process regimes: Leveraging unsupervised learning for process insights, surrogate modeling, and sensitivity analysis
title_sort discovering deposition process regimes leveraging unsupervised learning for process insights surrogate modeling and sensitivity analysis
topic Arrhenius plot
Fe CVD reactor
Hierarchical clustering
Polynomial chaos expansion
Uncertainty quantification
Sensitivity analysis
url http://www.sciencedirect.com/science/article/pii/S266682112400084X
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